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Aluminum
2
Atomic layer deposited
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Atomic layer deposition
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C-V measurement
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Capacitance-voltage techniques
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Constant capacitance
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Electrical characteristic
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Electron trap density
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Electron traps
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Experimental evidence
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Insulating layers
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MOS capacitors
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Main effect
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Memory applications
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Nanoparticle layers
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Non-volatile memories
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Non-volatile memory application
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Physical model
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Resistive switching
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TiO
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1por Goren, E., Ungureanu, M., Zazpe, R., Rozenberg, M., Hueso, L.E., Stoliar, P., Tsur, Y., Casanova, F.Materias: “...Memory applications...”
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3por Sambuco Salomone, L., Lipovetzky, J., Carbonetto, S.H., García Inza, M.A., Redin, E.G., Campabadal, F., Faigón, A.Materias: “...Non-volatile memory application...”
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4Publicado 2013Materias: “...Non-volatile memory application...”