Arrays of sub-100 nm features fabricated with table top extreme ultraviolet interferometric laser lithography

Mostrar todas las versiones(4)

Arrays of nano-dots were demonstrated by multiple exposure interferometric lithography using a table top λ=46.9 nm wavelength laser. Patterns of different geometries with features ~ 60 nm FWHM were printed controlling the exposure dose. © 2007 Optical Society of America.

Guardado en:
Detalles Bibliográficos
Autores principales: Wachulak, P.W., Capeluto, M.G., Marconi, M.C., Menoni, C.S., Rocca, J.J.
Formato: CONF
Materias:
Different geometry
Exposure dose
Extreme Ultraviolet
Interferometric lithography
Laser lithography
Multiple exposure
Sub-100 nm
Wavelength lasers
Interferometry
Acceso en línea:http://hdl.handle.net/20.500.12110/paper_21622701_v_n_p_Wachulak
Aporte de:
Biblioteca Digital - Facultad de Ciencias Exactas y Naturales (UBA) de Universidad de Buenos Aires
Descripción
Sumario:Arrays of nano-dots were demonstrated by multiple exposure interferometric lithography using a table top λ=46.9 nm wavelength laser. Patterns of different geometries with features ~ 60 nm FWHM were printed controlling the exposure dose. © 2007 Optical Society of America.

Ejemplares similares