Arrays of sub-100 nm features fabricated with table top extreme ultraviolet interferometric laser lithography

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Arrays of nano-dots were demonstrated by multiple exposure interferometric lithography using a table top λ=46.9 nm wavelength laser. Patterns of different geometries with features ~ 60 nm FWHM were printed controlling the exposure dose. © 2007 Optical Society of America.

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Autores principales: Wachulak, P.W., Capeluto, M.G., Marconi, M.C., Menoni, C.S., Rocca, J.J.
Formato: CONF
Materias:
Different geometry
Exposure dose
Extreme Ultraviolet
Interferometric lithography
Laser lithography
Multiple exposure
Sub-100 nm
Wavelength lasers
Interferometry
Acceso en línea:http://hdl.handle.net/20.500.12110/paper_21622701_v_n_p_Wachulak
Aporte de:
Biblioteca Digital - Facultad de Ciencias Exactas y Naturales (UBA) de Universidad de Buenos Aires
id todo:paper_21622701_v_n_p_Wachulak
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spelling todo:paper_21622701_v_n_p_Wachulak2023-10-03T16:39:35Z Arrays of sub-100 nm features fabricated with table top extreme ultraviolet interferometric laser lithography Wachulak, P.W. Capeluto, M.G. Marconi, M.C. Menoni, C.S. Rocca, J.J. Different geometry Exposure dose Extreme Ultraviolet Interferometric lithography Laser lithography Multiple exposure Sub-100 nm Wavelength lasers Interferometry Arrays of nano-dots were demonstrated by multiple exposure interferometric lithography using a table top λ=46.9 nm wavelength laser. Patterns of different geometries with features ~ 60 nm FWHM were printed controlling the exposure dose. © 2007 Optical Society of America. CONF info:eu-repo/semantics/openAccess http://creativecommons.org/licenses/by/2.5/ar http://hdl.handle.net/20.500.12110/paper_21622701_v_n_p_Wachulak
institution Universidad de Buenos Aires
institution_str I-28
repository_str R-134
collection Biblioteca Digital - Facultad de Ciencias Exactas y Naturales (UBA)
topic Different geometry
Exposure dose
Extreme Ultraviolet
Interferometric lithography
Laser lithography
Multiple exposure
Sub-100 nm
Wavelength lasers
Interferometry
spellingShingle Different geometry
Exposure dose
Extreme Ultraviolet
Interferometric lithography
Laser lithography
Multiple exposure
Sub-100 nm
Wavelength lasers
Interferometry
Wachulak, P.W.
Capeluto, M.G.
Marconi, M.C.
Menoni, C.S.
Rocca, J.J.
Arrays of sub-100 nm features fabricated with table top extreme ultraviolet interferometric laser lithography
topic_facet Different geometry
Exposure dose
Extreme Ultraviolet
Interferometric lithography
Laser lithography
Multiple exposure
Sub-100 nm
Wavelength lasers
Interferometry
description Arrays of nano-dots were demonstrated by multiple exposure interferometric lithography using a table top λ=46.9 nm wavelength laser. Patterns of different geometries with features ~ 60 nm FWHM were printed controlling the exposure dose. © 2007 Optical Society of America.
format CONF
author Wachulak, P.W.
Capeluto, M.G.
Marconi, M.C.
Menoni, C.S.
Rocca, J.J.
author_facet Wachulak, P.W.
Capeluto, M.G.
Marconi, M.C.
Menoni, C.S.
Rocca, J.J.
author_sort Wachulak, P.W.
title Arrays of sub-100 nm features fabricated with table top extreme ultraviolet interferometric laser lithography
title_short Arrays of sub-100 nm features fabricated with table top extreme ultraviolet interferometric laser lithography
title_full Arrays of sub-100 nm features fabricated with table top extreme ultraviolet interferometric laser lithography
title_fullStr Arrays of sub-100 nm features fabricated with table top extreme ultraviolet interferometric laser lithography
title_full_unstemmed Arrays of sub-100 nm features fabricated with table top extreme ultraviolet interferometric laser lithography
title_sort arrays of sub-100 nm features fabricated with table top extreme ultraviolet interferometric laser lithography
url http://hdl.handle.net/20.500.12110/paper_21622701_v_n_p_Wachulak
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AT capelutomg arraysofsub100nmfeaturesfabricatedwithtabletopextremeultravioletinterferometriclaserlithography
AT marconimc arraysofsub100nmfeaturesfabricatedwithtabletopextremeultravioletinterferometriclaserlithography
AT menonics arraysofsub100nmfeaturesfabricatedwithtabletopextremeultravioletinterferometriclaserlithography
AT roccajj arraysofsub100nmfeaturesfabricatedwithtabletopextremeultravioletinterferometriclaserlithography
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