Design of a phase shifting interferometer in the EUV for high precision metrology

We present the design of phase shift interferometer for the extreme ultraviolet (EUV) that will be used with the illumination provided by a table top Ne-like Ar laser emitting at 46.9 nm. We develop a model that computes the beam propagation trough the instrument, taking into account the influence o...

Descripción completa

Guardado en:

Detalles Bibliográficos
Autores principales:	Capeluto, María Gabriela, Marconi, Mario Carlos, Iemmi, Claudio César
Publicado:	2011
Materias:	Argon lasers Extreme ultraviolet lithography Interferometers Pulsed lasers Ar-laser EUV lasers Extreme ultraviolets High-precision Ne-like Phase-shift interferometer Phase-shifting interferometers Table-top Phase shift
Acceso en línea:	https://bibliotecadigital.exactas.uba.ar/collection/paper/document/paper_17426588_v274_n1_p_Capeluto http://hdl.handle.net/20.500.12110/paper_17426588_v274_n1_p_Capeluto
Aporte de:	Biblioteca Digital - Facultad de Ciencias Exactas y Naturales (UBA) de Universidad de Buenos Aires

Ejemplares similares

Design of a phase shifting interferometer in the EUV for high precision metrology
por: Capeluto, M.G., et al.
Publicado: (2011)

Design of a phase shifting interferometer in the EUV for high precision metrology
por: Capeluto, M.G., et al.

Design of a phase shifting interferometer in the EUV for high precision metrology
por: Capeluto, M.G., et al.
Publicado: (2011)

Design of a phase-shifting interferometer in the extreme ultraviolet for high-precision metrology
por: Capeluto, María Gabriela, et al.
Publicado: (2014)

Design of a phase-shifting interferometer in the extreme ultraviolet for high-precision metrology
por: Capeluto, M.G., et al.

New opportunities in interferometric lithography using extreme ultraviolet tabletop lasers
por: Capeluto, María Gabriela, et al.
Publicado: (2009)

New opportunities in interferometric lithography using extreme ultraviolet tabletop lasers
por: Wachulak, P.W., et al.

Nanopatterning in a compact setup using table top extreme ultraviolet lasers
por: Capeluto, María Gabriela, et al.
Publicado: (2008)

Nanopatterning in a compact setup using table top extreme ultraviolet lasers
por: Wachulak, P.W., et al.
Publicado: (2008)

Nanopatterning in a compact setup using table top extreme ultraviolet lasers
por: Wachulak, P.W., et al.

Nanopatterning in a compact setup using table top extreme ultraviolet lasers
por: Wachulak, P.W., et al.
Publicado: (2008)

Dense plasma diagnostics with an amplitude-division soft-x-ray laser interferometer based on diffraction gratings
por: Marconi, Mario Carlos, et al.
Publicado: (2000)

Dense plasma diagnostics with an amplitude-division soft-x-ray laser interferometer based on diffraction gratings
por: Filevich, J., et al.

Table top nanopatterning with extreme ultraviolet laser illumination
por: Capeluto, María Gabriela, et al.
Publicado: (2007)

Table top nanopatterning with extreme ultraviolet laser illumination
por: Capeluto, M.G., et al.

Arrays of sub-100 nm features fabricated with table top extreme ultraviolet interferometric laser lithography
por: Wachulak, P.W., et al.

Arrays of sub-100 nm features fabricated with table top extreme ultraviolet interferometric laser lithography
Publicado: (2007)

Nanolitografía y metrología de alta precisión en el ultravioleta extremo
por: Capeluto, María Gabriela
Publicado: (2009)

Nanolitografía y metrología de alta precisión en el ultravioleta extremo
por: Capeluto, María Gabriela
Publicado: (2009)

Nanolitografía y metrología de alta precisión en el ultravioleta extremo
por: Capeluto, María Gabriela
Publicado: (2009)

Laser metrology in fluid mechanics granulometry, temperature and concentration measurements /
Publicado: (2013)

Nanoscale patterning in high resolution HSQ photoresist by interferometric lithography with tabletop extreme ultraviolet lasers
por: Wachulak, P.W., et al.

Digital holographic movie by using a point diffraction interferometer
por: Iemmi, Claudio César
Publicado: (2015)

Digital holographic movie by using a point diffraction interferometer
por: Iemmi, C., et al.

Nanoscale patterning in high resolution HSQ photoresist by interferometric lithography with tabletop extreme ultraviolet lasers
Publicado: (2007)

Arrays of sub-100 nm features fabricated with table top extreme ultraviolet interferometric laser lithography
por: Wachulak, P.W., et al.

Nanopatterning and nanomachining with table-top extreme ultraviolet lasers
por: Marconi, Mario Carlos, et al.
Publicado: (2006)

Interferometric lithography at 46.9 nm
por: Capeluto, M.G., et al.

Arrays of sub-100 nm features fabricated with table top extreme ultraviolet interferometric laser lithography
Publicado: (2007)

Interferometric lithography at 46.9 nm
Publicado: (2004)

Nanopatterning and nanomachining with table-top extreme ultraviolet lasers
por: Marconi, M.C., et al.

Two-beam interferometer illuminated by a non-monochromatic incoherent periodic source: 1. Young's interferometer
Publicado: (2001)

Two-beam interferometer illuminated by a non-monochromatic incoherent periodic source: 1. Young's interferometer
por: Simon, J.M., et al.

Nanopatterning with interferometric lithography using a compact λ = 46.9-nm laser
por: Capeluto, M.G., et al.

Correction of aberrations in an optical correlator by using it as a point diffraction interferometer
por: Iemmi, Claudio César
Publicado: (2004)

Correction of aberrations in an optical correlator by using it as a point diffraction interferometer
por: Iemmi, C., et al.

Nanopatterning with interferometric lithography using a compact λ = 46.9-nm laser
Publicado: (2006)

Shifting of localization planes in optical testing: Application to a shearing interferometer
por: Simon, Juan Miguel, et al.
Publicado: (2001)

Shifting of localization planes in optical testing: Application to a shearing interferometer
por: Simon, J.M., et al.

Efficient picosecond x-ray pulse generation from plasmas in the radiation dominated regime
por: Hollinger, R., et al.