Fluorescent two-photon nanolithography

Improving the excitation conditions in two-photon fluorescent lithography reduces the size of the fabricated structures to nanometre scales. We demonstrate that a precise control of the illumination profile and the scanning speed of the laser beam is enough to decrease the photo-polymerization volum...

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Detalles Bibliográficos
Autores principales:	Kunik, Darío, Costantino, Santiago, Martínez, Oscar Eduardo
Publicado:	2008
Materias:	Lithography Nanolithography Two-photon absorption polymer article atomic force microscopy fluorescence image reconstruction nanotechnology photon polymerization priority journal
Acceso en línea:	https://bibliotecadigital.exactas.uba.ar/collection/paper/document/paper_00222720_v229_n3_p540_Kunik http://hdl.handle.net/20.500.12110/paper_00222720_v229_n3_p540_Kunik
Aporte de:	Biblioteca Digital - Facultad de Ciencias Exactas y Naturales (UBA) de Universidad de Buenos Aires

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