Fluorescent two-photon nanolithography

Improving the excitation conditions in two-photon fluorescent lithography reduces the size of the fabricated structures to nanometre scales. We demonstrate that a precise control of the illumination profile and the scanning speed of the laser beam is enough to decrease the photo-polymerization volum...

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Detalles Bibliográficos
Autores principales:	Kunik, Darío, Costantino, Santiago, Martínez, Oscar Eduardo
Publicado:	2008
Materias:	Lithography Nanolithography Two-photon absorption polymer article atomic force microscopy fluorescence image reconstruction nanotechnology photon polymerization priority journal
Acceso en línea:	https://bibliotecadigital.exactas.uba.ar/collection/paper/document/paper_00222720_v229_n3_p540_Kunik http://hdl.handle.net/20.500.12110/paper_00222720_v229_n3_p540_Kunik
Aporte de:	Biblioteca Digital - Facultad de Ciencias Exactas y Naturales (UBA) de Universidad de Buenos Aires

id	paper:paper_00222720_v229_n3_p540_Kunik
record_format	dspace
spelling	paper:paper_00222720_v229_n3_p540_Kunik2023-06-08T14:48:42Z Fluorescent two-photon nanolithography Kunik, Darío Costantino, Santiago Martínez, Oscar Eduardo Lithography Nanolithography Two-photon absorption polymer article atomic force microscopy fluorescence image reconstruction nanotechnology photon polymerization priority journal Improving the excitation conditions in two-photon fluorescent lithography reduces the size of the fabricated structures to nanometre scales. We demonstrate that a precise control of the illumination profile and the scanning speed of the laser beam is enough to decrease the photo-polymerization volume of resins by orders of magnitude. This work also shows experimental evidence of surface effects that yield a different polymerization intensity threshold compared with bulk. Such phenomenon enables to perform a non-linear optical nanolithography in a simple way, allowing fast-prototyping procedures. We present a detailed study of the polymer growth process using fluorescence and atomic force microscopy. © 2008 The Authors. Fil:Kunik, D. Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales; Argentina. Fil:Costantino, S. Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales; Argentina. Fil:Martínez, O.E. Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales; Argentina. 2008 https://bibliotecadigital.exactas.uba.ar/collection/paper/document/paper_00222720_v229_n3_p540_Kunik http://hdl.handle.net/20.500.12110/paper_00222720_v229_n3_p540_Kunik
institution	Universidad de Buenos Aires
institution_str	I-28
repository_str	R-134
collection	Biblioteca Digital - Facultad de Ciencias Exactas y Naturales (UBA)
topic	Lithography Nanolithography Two-photon absorption polymer article atomic force microscopy fluorescence image reconstruction nanotechnology photon polymerization priority journal
spellingShingle	Lithography Nanolithography Two-photon absorption polymer article atomic force microscopy fluorescence image reconstruction nanotechnology photon polymerization priority journal Kunik, Darío Costantino, Santiago Martínez, Oscar Eduardo Fluorescent two-photon nanolithography
topic_facet	Lithography Nanolithography Two-photon absorption polymer article atomic force microscopy fluorescence image reconstruction nanotechnology photon polymerization priority journal
description	Improving the excitation conditions in two-photon fluorescent lithography reduces the size of the fabricated structures to nanometre scales. We demonstrate that a precise control of the illumination profile and the scanning speed of the laser beam is enough to decrease the photo-polymerization volume of resins by orders of magnitude. This work also shows experimental evidence of surface effects that yield a different polymerization intensity threshold compared with bulk. Such phenomenon enables to perform a non-linear optical nanolithography in a simple way, allowing fast-prototyping procedures. We present a detailed study of the polymer growth process using fluorescence and atomic force microscopy. © 2008 The Authors.
author	Kunik, Darío Costantino, Santiago Martínez, Oscar Eduardo
author_facet	Kunik, Darío Costantino, Santiago Martínez, Oscar Eduardo
author_sort	Kunik, Darío
title	Fluorescent two-photon nanolithography
title_short	Fluorescent two-photon nanolithography
title_full	Fluorescent two-photon nanolithography
title_fullStr	Fluorescent two-photon nanolithography
title_full_unstemmed	Fluorescent two-photon nanolithography
title_sort	fluorescent two-photon nanolithography
publishDate	2008
url	https://bibliotecadigital.exactas.uba.ar/collection/paper/document/paper_00222720_v229_n3_p540_Kunik http://hdl.handle.net/20.500.12110/paper_00222720_v229_n3_p540_Kunik
work_keys_str_mv	AT kunikdario fluorescenttwophotonnanolithography AT costantinosantiago fluorescenttwophotonnanolithography AT martinezoscareduardo fluorescenttwophotonnanolithography
_version_	1768541973180841984

Fluorescent two-photon nanolithography

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