New opportunities in interferometric lithography using extreme ultraviolet tabletop lasers

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The development of tabletop extreme ultraviolet (EUV) lasers opens now the possibility to realize interferometric lithography systems at EUV wavelengths that easily fit on the top of an optical table. The high degree of spatial and temporal coherence and high brightness of the compact EUV laser sour...

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Autores principales: Wachulak, P.W., Urbanski, L., Capeluto, M.G., Hill, D., Rockward, W.S., Iemmi, C., Anderson, E.H., Menoni, C.S., Rocca, J.J., Marconi, M.C.
Formato: JOUR
Materias:
Extreme ultraviolet (EUV) lasers
Interferometric lithography
Nanopatterning
Interferometry
Lithography
Compact EUV lasers
Extreme Ultraviolet
Extreme ultraviolet lasers
High brightness
Laboratory environment
NanoPatterning
Optical tables
Spatial and temporal coherence
Tabletop lasers
Ultraviolet lasers
Acceso en línea:http://hdl.handle.net/20.500.12110/paper_19325150_v8_n2_p_Wachulak
Aporte de:
Biblioteca Digital - Facultad de Ciencias Exactas y Naturales (UBA) de Universidad de Buenos Aires
id todo:paper_19325150_v8_n2_p_Wachulak
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spelling todo:paper_19325150_v8_n2_p_Wachulak2023-10-03T16:34:28Z New opportunities in interferometric lithography using extreme ultraviolet tabletop lasers Wachulak, P.W. Urbanski, L. Capeluto, M.G. Hill, D. Rockward, W.S. Iemmi, C. Anderson, E.H. Menoni, C.S. Rocca, J.J. Marconi, M.C. Extreme ultraviolet (EUV) lasers Interferometric lithography Nanopatterning Interferometry Lithography Compact EUV lasers Extreme Ultraviolet Extreme ultraviolet lasers High brightness Interferometric lithography Laboratory environment NanoPatterning Optical tables Spatial and temporal coherence Tabletop lasers Ultraviolet lasers The development of tabletop extreme ultraviolet (EUV) lasers opens now the possibility to realize interferometric lithography systems at EUV wavelengths that easily fit on the top of an optical table. The high degree of spatial and temporal coherence and high brightness of the compact EUV laser sources make them a good option for interferometric applications. The combination of these novel sources with interferometric lithography setups brings to the laboratory environment capabilities that so far had been restricted exclusively to large synchrotron facilities. © 2009 Society of Photo-Optical Instrumentation Engineers. Fil:Capeluto, M.G. Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales; Argentina. Fil:Iemmi, C. Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales; Argentina. Fil:Marconi, M.C. Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales; Argentina. JOUR info:eu-repo/semantics/openAccess http://creativecommons.org/licenses/by/2.5/ar http://hdl.handle.net/20.500.12110/paper_19325150_v8_n2_p_Wachulak
institution Universidad de Buenos Aires
institution_str I-28
repository_str R-134
collection Biblioteca Digital - Facultad de Ciencias Exactas y Naturales (UBA)
topic Extreme ultraviolet (EUV) lasers
Interferometric lithography
Nanopatterning
Interferometry
Lithography
Compact EUV lasers
Extreme Ultraviolet
Extreme ultraviolet lasers
High brightness
Interferometric lithography
Laboratory environment
NanoPatterning
Optical tables
Spatial and temporal coherence
Tabletop lasers
Ultraviolet lasers
spellingShingle Extreme ultraviolet (EUV) lasers
Interferometric lithography
Nanopatterning
Interferometry
Lithography
Compact EUV lasers
Extreme Ultraviolet
Extreme ultraviolet lasers
High brightness
Interferometric lithography
Laboratory environment
NanoPatterning
Optical tables
Spatial and temporal coherence
Tabletop lasers
Ultraviolet lasers
Wachulak, P.W.
Urbanski, L.
Capeluto, M.G.
Hill, D.
Rockward, W.S.
Iemmi, C.
Anderson, E.H.
Menoni, C.S.
Rocca, J.J.
Marconi, M.C.
New opportunities in interferometric lithography using extreme ultraviolet tabletop lasers
topic_facet Extreme ultraviolet (EUV) lasers
Interferometric lithography
Nanopatterning
Interferometry
Lithography
Compact EUV lasers
Extreme Ultraviolet
Extreme ultraviolet lasers
High brightness
Interferometric lithography
Laboratory environment
NanoPatterning
Optical tables
Spatial and temporal coherence
Tabletop lasers
Ultraviolet lasers
description The development of tabletop extreme ultraviolet (EUV) lasers opens now the possibility to realize interferometric lithography systems at EUV wavelengths that easily fit on the top of an optical table. The high degree of spatial and temporal coherence and high brightness of the compact EUV laser sources make them a good option for interferometric applications. The combination of these novel sources with interferometric lithography setups brings to the laboratory environment capabilities that so far had been restricted exclusively to large synchrotron facilities. © 2009 Society of Photo-Optical Instrumentation Engineers.
format JOUR
author Wachulak, P.W.
Urbanski, L.
Capeluto, M.G.
Hill, D.
Rockward, W.S.
Iemmi, C.
Anderson, E.H.
Menoni, C.S.
Rocca, J.J.
Marconi, M.C.
author_facet Wachulak, P.W.
Urbanski, L.
Capeluto, M.G.
Hill, D.
Rockward, W.S.
Iemmi, C.
Anderson, E.H.
Menoni, C.S.
Rocca, J.J.
Marconi, M.C.
author_sort Wachulak, P.W.
title New opportunities in interferometric lithography using extreme ultraviolet tabletop lasers
title_short New opportunities in interferometric lithography using extreme ultraviolet tabletop lasers
title_full New opportunities in interferometric lithography using extreme ultraviolet tabletop lasers
title_fullStr New opportunities in interferometric lithography using extreme ultraviolet tabletop lasers
title_full_unstemmed New opportunities in interferometric lithography using extreme ultraviolet tabletop lasers
title_sort new opportunities in interferometric lithography using extreme ultraviolet tabletop lasers
url http://hdl.handle.net/20.500.12110/paper_19325150_v8_n2_p_Wachulak
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