New opportunities in interferometric lithography using extreme ultraviolet tabletop lasers
The development of tabletop extreme ultraviolet (EUV) lasers opens now the possibility to realize interferometric lithography systems at EUV wavelengths that easily fit on the top of an optical table. The high degree of spatial and temporal coherence and high brightness of the compact EUV laser sour...
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| Autores principales: | Wachulak, P.W., Urbanski, L., Capeluto, M.G., Hill, D., Rockward, W.S., Iemmi, C., Anderson, E.H., Menoni, C.S., Rocca, J.J., Marconi, M.C. |
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| Formato: | JOUR |
| Materias: | |
| Acceso en línea: | http://hdl.handle.net/20.500.12110/paper_19325150_v8_n2_p_Wachulak |
| Aporte de: |
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