Optimization of a PIII&D system using a cathodic arc with titanium

A plasma immersion ion implantation and deposition (PIII&D) system was recently built at INFIP. A dc cathodic arc with a Ti cathode of 5 cm in diameter and an annular anode of 8cm in diameter was employed as the plasma source. The substrate chamber was electrically insulated and connected with t...

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Detalles Bibliográficos
Autores principales:	Fazio, M., Kleiman, A., Lamas, D.G., Grondona, D., Marquez, A.
Formato:	CONF
Materias:	Atomic force microscopy Electrodes Ion implantation Plasma applications Pulse transformers Substrates X ray diffraction Discharge chamber Discharge currents Film structure Plasma immersion ion implantation and deposition Pulse amplitude Pulse frequencies Pulse parameter Steel substrate Electric discharges
Acceso en línea:	http://hdl.handle.net/20.500.12110/paper_17426588_v511_n1_p_Fazio
Aporte de:	Biblioteca Digital - Facultad de Ciencias Exactas y Naturales (UBA) de Universidad de Buenos Aires

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