Optimization of a PIII&D system using a cathodic arc with titanium
A plasma immersion ion implantation and deposition (PIII&D) system was recently built at INFIP. A dc cathodic arc with a Ti cathode of 5 cm in diameter and an annular anode of 8cm in diameter was employed as the plasma source. The substrate chamber was electrically insulated and connected with t...
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todo:paper_17426588_v511_n1_p_Fazio2023-10-03T16:30:55Z Optimization of a PIII&D system using a cathodic arc with titanium Fazio, M. Kleiman, A. Lamas, D.G. Grondona, D. Marquez, A. Atomic force microscopy Electrodes Ion implantation Plasma applications Pulse transformers Substrates X ray diffraction Discharge chamber Discharge currents Film structure Plasma immersion ion implantation and deposition Pulse amplitude Pulse frequencies Pulse parameter Steel substrate Electric discharges A plasma immersion ion implantation and deposition (PIII&D) system was recently built at INFIP. A dc cathodic arc with a Ti cathode of 5 cm in diameter and an annular anode of 8cm in diameter was employed as the plasma source. The substrate chamber was electrically insulated and connected with the main discharge chamber through a straight magnetic duct. The discharge current was run at 100 A. The substrate was biased with a pulsed generator (30 kV, 30 A, 0.05-3 kHz) based on a pulse transformer controlled by IGBT switches. In this work the optimization of the process as function of the pulse parameters is presented. The characteristics of Ti coatings on steel substrates obtained varying the pulse amplitude from 2 to 12 kV and the pulse frequency from 200 Hz to 400 Hz were analyzed and compared with films grown without biasing the substrate. The thickness was determined weighting the samples before and after the treatment. The morphology was observed with an atomic force microscope. The film structure was studied by x-ray diffraction. Fil:Fazio, M. Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales; Argentina. Fil:Kleiman, A. Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales; Argentina. Fil:Lamas, D.G. Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales; Argentina. Fil:Grondona, D. Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales; Argentina. Fil:Marquez, A. Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales; Argentina. CONF info:eu-repo/semantics/openAccess http://creativecommons.org/licenses/by/2.5/ar http://hdl.handle.net/20.500.12110/paper_17426588_v511_n1_p_Fazio |
| institution |
Universidad de Buenos Aires |
| institution_str |
I-28 |
| repository_str |
R-134 |
| collection |
Biblioteca Digital - Facultad de Ciencias Exactas y Naturales (UBA) |
| topic |
Atomic force microscopy Electrodes Ion implantation Plasma applications Pulse transformers Substrates X ray diffraction Discharge chamber Discharge currents Film structure Plasma immersion ion implantation and deposition Pulse amplitude Pulse frequencies Pulse parameter Steel substrate Electric discharges |
| spellingShingle |
Atomic force microscopy Electrodes Ion implantation Plasma applications Pulse transformers Substrates X ray diffraction Discharge chamber Discharge currents Film structure Plasma immersion ion implantation and deposition Pulse amplitude Pulse frequencies Pulse parameter Steel substrate Electric discharges Fazio, M. Kleiman, A. Lamas, D.G. Grondona, D. Marquez, A. Optimization of a PIII&D system using a cathodic arc with titanium |
| topic_facet |
Atomic force microscopy Electrodes Ion implantation Plasma applications Pulse transformers Substrates X ray diffraction Discharge chamber Discharge currents Film structure Plasma immersion ion implantation and deposition Pulse amplitude Pulse frequencies Pulse parameter Steel substrate Electric discharges |
| description |
A plasma immersion ion implantation and deposition (PIII&D) system was recently built at INFIP. A dc cathodic arc with a Ti cathode of 5 cm in diameter and an annular anode of 8cm in diameter was employed as the plasma source. The substrate chamber was electrically insulated and connected with the main discharge chamber through a straight magnetic duct. The discharge current was run at 100 A. The substrate was biased with a pulsed generator (30 kV, 30 A, 0.05-3 kHz) based on a pulse transformer controlled by IGBT switches. In this work the optimization of the process as function of the pulse parameters is presented. The characteristics of Ti coatings on steel substrates obtained varying the pulse amplitude from 2 to 12 kV and the pulse frequency from 200 Hz to 400 Hz were analyzed and compared with films grown without biasing the substrate. The thickness was determined weighting the samples before and after the treatment. The morphology was observed with an atomic force microscope. The film structure was studied by x-ray diffraction. |
| format |
CONF |
| author |
Fazio, M. Kleiman, A. Lamas, D.G. Grondona, D. Marquez, A. |
| author_facet |
Fazio, M. Kleiman, A. Lamas, D.G. Grondona, D. Marquez, A. |
| author_sort |
Fazio, M. |
| title |
Optimization of a PIII&D system using a cathodic arc with titanium |
| title_short |
Optimization of a PIII&D system using a cathodic arc with titanium |
| title_full |
Optimization of a PIII&D system using a cathodic arc with titanium |
| title_fullStr |
Optimization of a PIII&D system using a cathodic arc with titanium |
| title_full_unstemmed |
Optimization of a PIII&D system using a cathodic arc with titanium |
| title_sort |
optimization of a piii&d system using a cathodic arc with titanium |
| url |
http://hdl.handle.net/20.500.12110/paper_17426588_v511_n1_p_Fazio |
| work_keys_str_mv |
AT faziom optimizationofapiiidsystemusingacathodicarcwithtitanium AT kleimana optimizationofapiiidsystemusingacathodicarcwithtitanium AT lamasdg optimizationofapiiidsystemusingacathodicarcwithtitanium AT grondonad optimizationofapiiidsystemusingacathodicarcwithtitanium AT marqueza optimizationofapiiidsystemusingacathodicarcwithtitanium |
| _version_ |
1807323549633871872 |