Interferometric lithography with sub-100-nm resolution using a tabletop 46.9-nm laser
Combining a compact table top soft X ray laser with an interferometric lithography set up arrays of nanodots and nanoholes were directly patterned on the surface of different photoresists. Multiple exposures with a Lloyd's mirror interferometer printed arrays of holes and dots over an area of 0...
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| Autores principales: | Wachulak, P.W., Patel, D., Capeluto, M.G., Menoni, C.S., Rocca, J.J., Marconi, M.C. |
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| Formato: | CONF |
| Materias: | |
| Acceso en línea: | http://hdl.handle.net/20.500.12110/paper_0277786X_v6702_n_p_Wachulak |
| Aporte de: |
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