Interferometric lithography with sub-100-nm resolution using a tabletop 46.9-nm laser

Mostrar todas las versiones(2)

Combining a compact table top soft X ray laser with an interferometric lithography set up arrays of nanodots and nanoholes were directly patterned on the surface of different photoresists. Multiple exposures with a Lloyd's mirror interferometer printed arrays of holes and dots over an area of 0...

Descripción completa

Guardado en:
Detalles Bibliográficos
Autores principales: Wachulak, P.W., Patel, D., Capeluto, M.G., Menoni, C.S., Rocca, J.J., Marconi, M.C.
Formato: CONF
Materias:
Interferometric lithography
Nanopatterning
Soft X-ray lasers
Interferometry
Mirrors
Photoresists
X ray lasers
Nanodots
Nanoholes
Lithography
Acceso en línea:http://hdl.handle.net/20.500.12110/paper_0277786X_v6702_n_p_Wachulak
Aporte de:
Biblioteca Digital - Facultad de Ciencias Exactas y Naturales (UBA) de Universidad de Buenos Aires
id todo:paper_0277786X_v6702_n_p_Wachulak
record_format dspace
spelling todo:paper_0277786X_v6702_n_p_Wachulak2023-10-03T15:16:38Z Interferometric lithography with sub-100-nm resolution using a tabletop 46.9-nm laser Wachulak, P.W. Patel, D. Capeluto, M.G. Menoni, C.S. Rocca, J.J. Marconi, M.C. Interferometric lithography Nanopatterning Soft X-ray lasers Interferometry Mirrors Photoresists X ray lasers Interferometric lithography Nanodots Nanoholes Lithography Combining a compact table top soft X ray laser with an interferometric lithography set up arrays of nanodots and nanoholes were directly patterned on the surface of different photoresists. Multiple exposures with a Lloyd's mirror interferometer printed arrays of holes and dots over an area of 0.5× 0.5 mm2 with typical diameters down to 60 nm full width at half maximum. This laser-based soft X-ray interferometric tool demonstrated the possibility to print different nanoscale patterns using a compact table-top set up. CONF info:eu-repo/semantics/openAccess http://creativecommons.org/licenses/by/2.5/ar http://hdl.handle.net/20.500.12110/paper_0277786X_v6702_n_p_Wachulak
institution Universidad de Buenos Aires
institution_str I-28
repository_str R-134
collection Biblioteca Digital - Facultad de Ciencias Exactas y Naturales (UBA)
topic Interferometric lithography
Nanopatterning
Soft X-ray lasers
Interferometry
Mirrors
Photoresists
X ray lasers
Interferometric lithography
Nanodots
Nanoholes
Lithography
spellingShingle Interferometric lithography
Nanopatterning
Soft X-ray lasers
Interferometry
Mirrors
Photoresists
X ray lasers
Interferometric lithography
Nanodots
Nanoholes
Lithography
Wachulak, P.W.
Patel, D.
Capeluto, M.G.
Menoni, C.S.
Rocca, J.J.
Marconi, M.C.
Interferometric lithography with sub-100-nm resolution using a tabletop 46.9-nm laser
topic_facet Interferometric lithography
Nanopatterning
Soft X-ray lasers
Interferometry
Mirrors
Photoresists
X ray lasers
Interferometric lithography
Nanodots
Nanoholes
Lithography
description Combining a compact table top soft X ray laser with an interferometric lithography set up arrays of nanodots and nanoholes were directly patterned on the surface of different photoresists. Multiple exposures with a Lloyd's mirror interferometer printed arrays of holes and dots over an area of 0.5× 0.5 mm2 with typical diameters down to 60 nm full width at half maximum. This laser-based soft X-ray interferometric tool demonstrated the possibility to print different nanoscale patterns using a compact table-top set up.
format CONF
author Wachulak, P.W.
Patel, D.
Capeluto, M.G.
Menoni, C.S.
Rocca, J.J.
Marconi, M.C.
author_facet Wachulak, P.W.
Patel, D.
Capeluto, M.G.
Menoni, C.S.
Rocca, J.J.
Marconi, M.C.
author_sort Wachulak, P.W.
title Interferometric lithography with sub-100-nm resolution using a tabletop 46.9-nm laser
title_short Interferometric lithography with sub-100-nm resolution using a tabletop 46.9-nm laser
title_full Interferometric lithography with sub-100-nm resolution using a tabletop 46.9-nm laser
title_fullStr Interferometric lithography with sub-100-nm resolution using a tabletop 46.9-nm laser
title_full_unstemmed Interferometric lithography with sub-100-nm resolution using a tabletop 46.9-nm laser
title_sort interferometric lithography with sub-100-nm resolution using a tabletop 46.9-nm laser
url http://hdl.handle.net/20.500.12110/paper_0277786X_v6702_n_p_Wachulak
work_keys_str_mv AT wachulakpw interferometriclithographywithsub100nmresolutionusingatabletop469nmlaser
AT pateld interferometriclithographywithsub100nmresolutionusingatabletop469nmlaser
AT capelutomg interferometriclithographywithsub100nmresolutionusingatabletop469nmlaser
AT menonics interferometriclithographywithsub100nmresolutionusingatabletop469nmlaser
AT roccajj interferometriclithographywithsub100nmresolutionusingatabletop469nmlaser
AT marconimc interferometriclithographywithsub100nmresolutionusingatabletop469nmlaser
_version_ 1807317133410959360

Ejemplares similares