Anatase TiO2 films obtained by cathodic arc deposition
TiO2 thin films were prepared on glass substrates at different temperatures employing an unfiltered cathodic arc device. The temperature values were varied from room temperature to 400 °C. The crystalline structure of the films was determined by X-ray diffraction. The surface morphology was studied...
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| Acceso en línea: | http://hdl.handle.net/20.500.12110/paper_02578972_v201_n14_p6358_Kleiman |
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todo:paper_02578972_v201_n14_p6358_Kleiman2023-10-03T15:11:39Z Anatase TiO2 films obtained by cathodic arc deposition Kleiman, A. Márquez, A. Lamas, D.G. Arc evaporation Atomic force microscopy (AFM) Structure Titanium oxide Deposition Grain size and shape Phase transitions Surface morphology Surface roughness Thermal effects Thin films Arc evaporation Cathodic arc deposition Crystalline structure Titanium dioxide Deposition Grain size and shape Phase transitions Surface morphology Surface roughness Thermal effects Thin films Titanium dioxide TiO2 thin films were prepared on glass substrates at different temperatures employing an unfiltered cathodic arc device. The temperature values were varied from room temperature to 400 °C. The crystalline structure of the films was determined by X-ray diffraction. The surface morphology was studied by scanning electron microscopy and atomic force microscopy. Transmittance in UV-visible region was also measured. All films deposited at temperatures lower than 300 °C were amorphous, whereas films obtained at higher temperatures grew in crystalline anatase phase. Phase transition amorphous-to-anatase was observed after post-annealing at 400 °C. The average transmittance value for all films was higher than 80%, a comparison among the films obtained at different temperatures showed a transmittance value slightly higher for films obtained at highest temperatures. Grain size for as-deposited crystalline films was determined approximately in 20 nm, with a surface roughness of about 2 nm. © 2006 Elsevier B.V. All rights reserved. Fil:Kleiman, A. Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales; Argentina. Fil:Márquez, A. Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales; Argentina. Fil:Lamas, D.G. Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales; Argentina. JOUR info:eu-repo/semantics/openAccess http://creativecommons.org/licenses/by/2.5/ar http://hdl.handle.net/20.500.12110/paper_02578972_v201_n14_p6358_Kleiman |
| institution |
Universidad de Buenos Aires |
| institution_str |
I-28 |
| repository_str |
R-134 |
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Biblioteca Digital - Facultad de Ciencias Exactas y Naturales (UBA) |
| topic |
Arc evaporation Atomic force microscopy (AFM) Structure Titanium oxide Deposition Grain size and shape Phase transitions Surface morphology Surface roughness Thermal effects Thin films Arc evaporation Cathodic arc deposition Crystalline structure Titanium dioxide Deposition Grain size and shape Phase transitions Surface morphology Surface roughness Thermal effects Thin films Titanium dioxide |
| spellingShingle |
Arc evaporation Atomic force microscopy (AFM) Structure Titanium oxide Deposition Grain size and shape Phase transitions Surface morphology Surface roughness Thermal effects Thin films Arc evaporation Cathodic arc deposition Crystalline structure Titanium dioxide Deposition Grain size and shape Phase transitions Surface morphology Surface roughness Thermal effects Thin films Titanium dioxide Kleiman, A. Márquez, A. Lamas, D.G. Anatase TiO2 films obtained by cathodic arc deposition |
| topic_facet |
Arc evaporation Atomic force microscopy (AFM) Structure Titanium oxide Deposition Grain size and shape Phase transitions Surface morphology Surface roughness Thermal effects Thin films Arc evaporation Cathodic arc deposition Crystalline structure Titanium dioxide Deposition Grain size and shape Phase transitions Surface morphology Surface roughness Thermal effects Thin films Titanium dioxide |
| description |
TiO2 thin films were prepared on glass substrates at different temperatures employing an unfiltered cathodic arc device. The temperature values were varied from room temperature to 400 °C. The crystalline structure of the films was determined by X-ray diffraction. The surface morphology was studied by scanning electron microscopy and atomic force microscopy. Transmittance in UV-visible region was also measured. All films deposited at temperatures lower than 300 °C were amorphous, whereas films obtained at higher temperatures grew in crystalline anatase phase. Phase transition amorphous-to-anatase was observed after post-annealing at 400 °C. The average transmittance value for all films was higher than 80%, a comparison among the films obtained at different temperatures showed a transmittance value slightly higher for films obtained at highest temperatures. Grain size for as-deposited crystalline films was determined approximately in 20 nm, with a surface roughness of about 2 nm. © 2006 Elsevier B.V. All rights reserved. |
| format |
JOUR |
| author |
Kleiman, A. Márquez, A. Lamas, D.G. |
| author_facet |
Kleiman, A. Márquez, A. Lamas, D.G. |
| author_sort |
Kleiman, A. |
| title |
Anatase TiO2 films obtained by cathodic arc deposition |
| title_short |
Anatase TiO2 films obtained by cathodic arc deposition |
| title_full |
Anatase TiO2 films obtained by cathodic arc deposition |
| title_fullStr |
Anatase TiO2 films obtained by cathodic arc deposition |
| title_full_unstemmed |
Anatase TiO2 films obtained by cathodic arc deposition |
| title_sort |
anatase tio2 films obtained by cathodic arc deposition |
| url |
http://hdl.handle.net/20.500.12110/paper_02578972_v201_n14_p6358_Kleiman |
| work_keys_str_mv |
AT kleimana anatasetio2filmsobtainedbycathodicarcdeposition AT marqueza anatasetio2filmsobtainedbycathodicarcdeposition AT lamasdg anatasetio2filmsobtainedbycathodicarcdeposition |
| _version_ |
1782025402725695488 |