A simple three step method for selective placement of organic groups in mesoporous silica thin films

Selective functionalization of mesoporous silica thin films was achieved using a three step method. The first step consists in an outer surface functionalization, followed by washing off the structuring agent (second step), leaving the inner surface of the pores free to be functionalized in the thir...

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Autores principales:	Franceschini, E.A., Llave, E.D.L., Williams, F.J., Soler-Illia, G.J.A.A.
Formato:	JOUR
Materias:	Nanostructures Sol-gel growth Surface properties Thin films Vapor deposition X-ray photo-emission spectroscopy (XPS) Deposition Emission spectroscopy Mesoporous materials Photoelectron spectroscopy Silica Sol-gels X ray photoelectron spectroscopy Ellipsometric porosimetry Functionalized silica Mesoporous silica film Mesoporous silica thin films Mesoporous thin films Selective functionalization X ray photoemission spectroscopy
Acceso en línea:	http://hdl.handle.net/20.500.12110/paper_02540584_v169_n_p82_Franceschini
Aporte de:	Biblioteca Digital - Facultad de Ciencias Exactas y Naturales (UBA) de Universidad de Buenos Aires

id	todo:paper_02540584_v169_n_p82_Franceschini
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spelling	todo:paper_02540584_v169_n_p82_Franceschini2023-10-03T15:11:31Z A simple three step method for selective placement of organic groups in mesoporous silica thin films Franceschini, E.A. Llave, E.D.L. Williams, F.J. Soler-Illia, G.J.A.A. Nanostructures Sol-gel growth Surface properties Thin films Vapor deposition X-ray photo-emission spectroscopy (XPS) Deposition Emission spectroscopy Mesoporous materials Nanostructures Photoelectron spectroscopy Silica Sol-gels Surface properties Vapor deposition X ray photoelectron spectroscopy Ellipsometric porosimetry Functionalized silica Mesoporous silica film Mesoporous silica thin films Mesoporous thin films Selective functionalization Sol-gel growth X ray photoemission spectroscopy Thin films Selective functionalization of mesoporous silica thin films was achieved using a three step method. The first step consists in an outer surface functionalization, followed by washing off the structuring agent (second step), leaving the inner surface of the pores free to be functionalized in the third step. This reproducible method permits to anchor a volatile silane group in the outer film surface, and a second type of silane group in the inner surface of the pores. As a concept test we modified the outer surface of a mesoporous silica film with trimethylsilane (-Si-(CH3)3) groups and the inner pore surface with propylamino (-Si-(CH2)3-NH2) groups. The obtained silica films were characterized by Environmental Ellipsometric Porosimetry (EEP), EDS, XPS, contact angle and electron microscopy. The selectively functionalized silica (SF) shows an amount of surface amino functions 4.3 times lower than the one-step functionalized (OSF) silica samples. The method presented here can be extended to a combination of silane chlorides and alkoxides as functional groups, opening up a new route toward the synthesis of multifunctional mesoporous thin films with precisely localized organic functions. © 2015 Elsevier B.V. All rights reserved. Fil:Franceschini, E.A. Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales; Argentina. Fil:Williams, F.J. Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales; Argentina. Fil:Soler-Illia, G.J.A.A. Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales; Argentina. JOUR info:eu-repo/semantics/openAccess http://creativecommons.org/licenses/by/2.5/ar http://hdl.handle.net/20.500.12110/paper_02540584_v169_n_p82_Franceschini
institution	Universidad de Buenos Aires
institution_str	I-28
repository_str	R-134
collection	Biblioteca Digital - Facultad de Ciencias Exactas y Naturales (UBA)
topic	Nanostructures Sol-gel growth Surface properties Thin films Vapor deposition X-ray photo-emission spectroscopy (XPS) Deposition Emission spectroscopy Mesoporous materials Nanostructures Photoelectron spectroscopy Silica Sol-gels Surface properties Vapor deposition X ray photoelectron spectroscopy Ellipsometric porosimetry Functionalized silica Mesoporous silica film Mesoporous silica thin films Mesoporous thin films Selective functionalization Sol-gel growth X ray photoemission spectroscopy Thin films
spellingShingle	Nanostructures Sol-gel growth Surface properties Thin films Vapor deposition X-ray photo-emission spectroscopy (XPS) Deposition Emission spectroscopy Mesoporous materials Nanostructures Photoelectron spectroscopy Silica Sol-gels Surface properties Vapor deposition X ray photoelectron spectroscopy Ellipsometric porosimetry Functionalized silica Mesoporous silica film Mesoporous silica thin films Mesoporous thin films Selective functionalization Sol-gel growth X ray photoemission spectroscopy Thin films Franceschini, E.A. Llave, E.D.L. Williams, F.J. Soler-Illia, G.J.A.A. A simple three step method for selective placement of organic groups in mesoporous silica thin films
topic_facet	Nanostructures Sol-gel growth Surface properties Thin films Vapor deposition X-ray photo-emission spectroscopy (XPS) Deposition Emission spectroscopy Mesoporous materials Nanostructures Photoelectron spectroscopy Silica Sol-gels Surface properties Vapor deposition X ray photoelectron spectroscopy Ellipsometric porosimetry Functionalized silica Mesoporous silica film Mesoporous silica thin films Mesoporous thin films Selective functionalization Sol-gel growth X ray photoemission spectroscopy Thin films
description	Selective functionalization of mesoporous silica thin films was achieved using a three step method. The first step consists in an outer surface functionalization, followed by washing off the structuring agent (second step), leaving the inner surface of the pores free to be functionalized in the third step. This reproducible method permits to anchor a volatile silane group in the outer film surface, and a second type of silane group in the inner surface of the pores. As a concept test we modified the outer surface of a mesoporous silica film with trimethylsilane (-Si-(CH3)3) groups and the inner pore surface with propylamino (-Si-(CH2)3-NH2) groups. The obtained silica films were characterized by Environmental Ellipsometric Porosimetry (EEP), EDS, XPS, contact angle and electron microscopy. The selectively functionalized silica (SF) shows an amount of surface amino functions 4.3 times lower than the one-step functionalized (OSF) silica samples. The method presented here can be extended to a combination of silane chlorides and alkoxides as functional groups, opening up a new route toward the synthesis of multifunctional mesoporous thin films with precisely localized organic functions. © 2015 Elsevier B.V. All rights reserved.
format	JOUR
author	Franceschini, E.A. Llave, E.D.L. Williams, F.J. Soler-Illia, G.J.A.A.
author_facet	Franceschini, E.A. Llave, E.D.L. Williams, F.J. Soler-Illia, G.J.A.A.
author_sort	Franceschini, E.A.
title	A simple three step method for selective placement of organic groups in mesoporous silica thin films
title_short	A simple three step method for selective placement of organic groups in mesoporous silica thin films
title_full	A simple three step method for selective placement of organic groups in mesoporous silica thin films
title_fullStr	A simple three step method for selective placement of organic groups in mesoporous silica thin films
title_full_unstemmed	A simple three step method for selective placement of organic groups in mesoporous silica thin films
title_sort	simple three step method for selective placement of organic groups in mesoporous silica thin films
url	http://hdl.handle.net/20.500.12110/paper_02540584_v169_n_p82_Franceschini
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_version_	1807322162929860608

A simple three step method for selective placement of organic groups in mesoporous silica thin films

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