Arrays of sub-100 nm features fabricated with table top extreme ultraviolet interferometric laser lithography

Arrays of nano-dots were demonstrated by multiple exposure interferometric lithography using a table top λ=46.9 nm wavelength laser. Patterns of different geometries with features ∼ 60 nm FWHM were printed controlling the exposure dose. © 2007 Optical Society of America.

Guardado en:
Detalles Bibliográficos
Publicado: 2007
Materias:
Different geometry
Exposure dose
Extreme Ultraviolet
Interferometric lithography
Laser lithography
Multiple exposure
Nanodots
Sub-100 nm
Table-top
Wavelength lasers
Interferometry
Ultraviolet lasers
Acceso en línea:https://bibliotecadigital.exactas.uba.ar/collection/paper/document/paper_97815575_v_n_p_Wachulak
http://hdl.handle.net/20.500.12110/paper_97815575_v_n_p_Wachulak
Aporte de:
Biblioteca Digital - Facultad de Ciencias Exactas y Naturales (UBA) de Universidad de Buenos Aires
id paper:paper_97815575_v_n_p_Wachulak
record_format dspace
spelling paper:paper_97815575_v_n_p_Wachulak2023-06-08T16:38:04Z Arrays of sub-100 nm features fabricated with table top extreme ultraviolet interferometric laser lithography Different geometry Exposure dose Extreme Ultraviolet Interferometric lithography Laser lithography Multiple exposure Nanodots Sub-100 nm Table-top Wavelength lasers Interferometry Ultraviolet lasers Arrays of nano-dots were demonstrated by multiple exposure interferometric lithography using a table top λ=46.9 nm wavelength laser. Patterns of different geometries with features ∼ 60 nm FWHM were printed controlling the exposure dose. © 2007 Optical Society of America. 2007 https://bibliotecadigital.exactas.uba.ar/collection/paper/document/paper_97815575_v_n_p_Wachulak http://hdl.handle.net/20.500.12110/paper_97815575_v_n_p_Wachulak
institution Universidad de Buenos Aires
institution_str I-28
repository_str R-134
collection Biblioteca Digital - Facultad de Ciencias Exactas y Naturales (UBA)
topic Different geometry
Exposure dose
Extreme Ultraviolet
Interferometric lithography
Laser lithography
Multiple exposure
Nanodots
Sub-100 nm
Table-top
Wavelength lasers
Interferometry
Ultraviolet lasers
spellingShingle Different geometry
Exposure dose
Extreme Ultraviolet
Interferometric lithography
Laser lithography
Multiple exposure
Nanodots
Sub-100 nm
Table-top
Wavelength lasers
Interferometry
Ultraviolet lasers
Arrays of sub-100 nm features fabricated with table top extreme ultraviolet interferometric laser lithography
topic_facet Different geometry
Exposure dose
Extreme Ultraviolet
Interferometric lithography
Laser lithography
Multiple exposure
Nanodots
Sub-100 nm
Table-top
Wavelength lasers
Interferometry
Ultraviolet lasers
description Arrays of nano-dots were demonstrated by multiple exposure interferometric lithography using a table top λ=46.9 nm wavelength laser. Patterns of different geometries with features ∼ 60 nm FWHM were printed controlling the exposure dose. © 2007 Optical Society of America.
title Arrays of sub-100 nm features fabricated with table top extreme ultraviolet interferometric laser lithography
title_short Arrays of sub-100 nm features fabricated with table top extreme ultraviolet interferometric laser lithography
title_full Arrays of sub-100 nm features fabricated with table top extreme ultraviolet interferometric laser lithography
title_fullStr Arrays of sub-100 nm features fabricated with table top extreme ultraviolet interferometric laser lithography
title_full_unstemmed Arrays of sub-100 nm features fabricated with table top extreme ultraviolet interferometric laser lithography
title_sort arrays of sub-100 nm features fabricated with table top extreme ultraviolet interferometric laser lithography
publishDate 2007
url https://bibliotecadigital.exactas.uba.ar/collection/paper/document/paper_97815575_v_n_p_Wachulak
http://hdl.handle.net/20.500.12110/paper_97815575_v_n_p_Wachulak
_version_ 1768543584571621376

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