Shock waves and commutation speed of memristors

Progress of silicon-based technology is nearing its physical limit, as the minimum feature size of components is reaching a mere 10 nm. The resistive switching behavior of transition metal oxides and the associated memristor device is emerging as a competitive technology for next-generation electron...

Descripción completa

Guardado en:
Detalles Bibliográficos
Autores principales: Levy, Pablo Eduardo, Rozenberg, Marcelo Javier
Publicado: 2016
Materias:
Acceso en línea:https://bibliotecadigital.exactas.uba.ar/collection/paper/document/paper_21603308_v6_n1_p_Tang
http://hdl.handle.net/20.500.12110/paper_21603308_v6_n1_p_Tang
Aporte de:
id paper:paper_21603308_v6_n1_p_Tang
record_format dspace
spelling paper:paper_21603308_v6_n1_p_Tang2023-06-08T16:34:25Z Shock waves and commutation speed of memristors Levy, Pablo Eduardo Rozenberg, Marcelo Javier Manganese oxide Memristors Oxygen vacancies Transition metal oxides Transition metals Vacancies Minimum feature sizes Model simulation Physical limits Resistive switching Resistive switching behaviors Silicon-based technology Technological aspects Trial and error Shock waves Progress of silicon-based technology is nearing its physical limit, as the minimum feature size of components is reaching a mere 10 nm. The resistive switching behavior of transition metal oxides and the associated memristor device is emerging as a competitive technology for next-generation electronics. Significant progress has already been made in the past decade, and devices are beginning to hit the market; however, this progress has mainly been the result of empirical trial and error. Hence, gaining theoretical insight is of the essence. In the present work, we report the striking result of a connection between the resistive switching and shock-wave formation, a classic topic of nonlinear dynamics. We argue that the profile of oxygen vacancies that migrate during the commutation forms a shock wave that propagates through a highly resistive region of the device. We validate the scenario by means of model simulations and experiments in a manganese-oxide-based memristor device, and we extend our theory to the case of binary oxides. The shock-wave scenario brings unprecedented physical insight and enables us to rationalize the process of oxygen-vacancy-driven resistive change with direct implications for a key technological aspect-the commutation speed. Fil:Levy, P. Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales; Argentina. Fil:Rozenberg, M. Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales; Argentina. 2016 https://bibliotecadigital.exactas.uba.ar/collection/paper/document/paper_21603308_v6_n1_p_Tang http://hdl.handle.net/20.500.12110/paper_21603308_v6_n1_p_Tang
institution Universidad de Buenos Aires
institution_str I-28
repository_str R-134
collection Biblioteca Digital - Facultad de Ciencias Exactas y Naturales (UBA)
topic Manganese oxide
Memristors
Oxygen vacancies
Transition metal oxides
Transition metals
Vacancies
Minimum feature sizes
Model simulation
Physical limits
Resistive switching
Resistive switching behaviors
Silicon-based technology
Technological aspects
Trial and error
Shock waves
spellingShingle Manganese oxide
Memristors
Oxygen vacancies
Transition metal oxides
Transition metals
Vacancies
Minimum feature sizes
Model simulation
Physical limits
Resistive switching
Resistive switching behaviors
Silicon-based technology
Technological aspects
Trial and error
Shock waves
Levy, Pablo Eduardo
Rozenberg, Marcelo Javier
Shock waves and commutation speed of memristors
topic_facet Manganese oxide
Memristors
Oxygen vacancies
Transition metal oxides
Transition metals
Vacancies
Minimum feature sizes
Model simulation
Physical limits
Resistive switching
Resistive switching behaviors
Silicon-based technology
Technological aspects
Trial and error
Shock waves
description Progress of silicon-based technology is nearing its physical limit, as the minimum feature size of components is reaching a mere 10 nm. The resistive switching behavior of transition metal oxides and the associated memristor device is emerging as a competitive technology for next-generation electronics. Significant progress has already been made in the past decade, and devices are beginning to hit the market; however, this progress has mainly been the result of empirical trial and error. Hence, gaining theoretical insight is of the essence. In the present work, we report the striking result of a connection between the resistive switching and shock-wave formation, a classic topic of nonlinear dynamics. We argue that the profile of oxygen vacancies that migrate during the commutation forms a shock wave that propagates through a highly resistive region of the device. We validate the scenario by means of model simulations and experiments in a manganese-oxide-based memristor device, and we extend our theory to the case of binary oxides. The shock-wave scenario brings unprecedented physical insight and enables us to rationalize the process of oxygen-vacancy-driven resistive change with direct implications for a key technological aspect-the commutation speed.
author Levy, Pablo Eduardo
Rozenberg, Marcelo Javier
author_facet Levy, Pablo Eduardo
Rozenberg, Marcelo Javier
author_sort Levy, Pablo Eduardo
title Shock waves and commutation speed of memristors
title_short Shock waves and commutation speed of memristors
title_full Shock waves and commutation speed of memristors
title_fullStr Shock waves and commutation speed of memristors
title_full_unstemmed Shock waves and commutation speed of memristors
title_sort shock waves and commutation speed of memristors
publishDate 2016
url https://bibliotecadigital.exactas.uba.ar/collection/paper/document/paper_21603308_v6_n1_p_Tang
http://hdl.handle.net/20.500.12110/paper_21603308_v6_n1_p_Tang
work_keys_str_mv AT levypabloeduardo shockwavesandcommutationspeedofmemristors
AT rozenbergmarcelojavier shockwavesandcommutationspeedofmemristors
_version_ 1768544061155704832