Cita APA (7a ed.)

Capeluto, M. G., Iemmi, C. C., & Marconi, M. C. (2009). New opportunities in interferometric lithography using extreme ultraviolet tabletop lasers.

Cita Chicago Style (17a ed.)

Capeluto, María Gabriela, Claudio César Iemmi, y Mario Carlos Marconi. New Opportunities in Interferometric Lithography Using Extreme Ultraviolet Tabletop Lasers. 2009.

Cita MLA (8a ed.)

Capeluto, María Gabriela, et al. New Opportunities in Interferometric Lithography Using Extreme Ultraviolet Tabletop Lasers. 2009.