New opportunities in interferometric lithography using extreme ultraviolet tabletop lasers

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The development of tabletop extreme ultraviolet (EUV) lasers opens now the possibility to realize interferometric lithography systems at EUV wavelengths that easily fit on the top of an optical table. The high degree of spatial and temporal coherence and high brightness of the compact EUV laser sour...

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Autores principales:	Capeluto, María Gabriela, Iemmi, Claudio César, Marconi, Mario Carlos
Publicado:	2009
Materias:	Extreme ultraviolet (EUV) lasers Interferometric lithography Nanopatterning Interferometry Lithography Compact EUV lasers Extreme Ultraviolet Extreme ultraviolet lasers High brightness Laboratory environment NanoPatterning Optical tables Spatial and temporal coherence Tabletop lasers Ultraviolet lasers
Acceso en línea:	https://bibliotecadigital.exactas.uba.ar/collection/paper/document/paper_19325150_v8_n2_p_Wachulak http://hdl.handle.net/20.500.12110/paper_19325150_v8_n2_p_Wachulak
Aporte de:	Biblioteca Digital - Facultad de Ciencias Exactas y Naturales (UBA) de Universidad de Buenos Aires

id	paper:paper_19325150_v8_n2_p_Wachulak
record_format	dspace
spelling	paper:paper_19325150_v8_n2_p_Wachulak2023-06-08T16:30:23Z New opportunities in interferometric lithography using extreme ultraviolet tabletop lasers Capeluto, María Gabriela Iemmi, Claudio César Marconi, Mario Carlos Extreme ultraviolet (EUV) lasers Interferometric lithography Nanopatterning Interferometry Lithography Compact EUV lasers Extreme Ultraviolet Extreme ultraviolet lasers High brightness Interferometric lithography Laboratory environment NanoPatterning Optical tables Spatial and temporal coherence Tabletop lasers Ultraviolet lasers The development of tabletop extreme ultraviolet (EUV) lasers opens now the possibility to realize interferometric lithography systems at EUV wavelengths that easily fit on the top of an optical table. The high degree of spatial and temporal coherence and high brightness of the compact EUV laser sources make them a good option for interferometric applications. The combination of these novel sources with interferometric lithography setups brings to the laboratory environment capabilities that so far had been restricted exclusively to large synchrotron facilities. © 2009 Society of Photo-Optical Instrumentation Engineers. Fil:Capeluto, M.G. Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales; Argentina. Fil:Iemmi, C. Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales; Argentina. Fil:Marconi, M.C. Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales; Argentina. 2009 https://bibliotecadigital.exactas.uba.ar/collection/paper/document/paper_19325150_v8_n2_p_Wachulak http://hdl.handle.net/20.500.12110/paper_19325150_v8_n2_p_Wachulak
institution	Universidad de Buenos Aires
institution_str	I-28
repository_str	R-134
collection	Biblioteca Digital - Facultad de Ciencias Exactas y Naturales (UBA)
topic	Extreme ultraviolet (EUV) lasers Interferometric lithography Nanopatterning Interferometry Lithography Compact EUV lasers Extreme Ultraviolet Extreme ultraviolet lasers High brightness Interferometric lithography Laboratory environment NanoPatterning Optical tables Spatial and temporal coherence Tabletop lasers Ultraviolet lasers
spellingShingle	Extreme ultraviolet (EUV) lasers Interferometric lithography Nanopatterning Interferometry Lithography Compact EUV lasers Extreme Ultraviolet Extreme ultraviolet lasers High brightness Interferometric lithography Laboratory environment NanoPatterning Optical tables Spatial and temporal coherence Tabletop lasers Ultraviolet lasers Capeluto, María Gabriela Iemmi, Claudio César Marconi, Mario Carlos New opportunities in interferometric lithography using extreme ultraviolet tabletop lasers
topic_facet	Extreme ultraviolet (EUV) lasers Interferometric lithography Nanopatterning Interferometry Lithography Compact EUV lasers Extreme Ultraviolet Extreme ultraviolet lasers High brightness Interferometric lithography Laboratory environment NanoPatterning Optical tables Spatial and temporal coherence Tabletop lasers Ultraviolet lasers
description	The development of tabletop extreme ultraviolet (EUV) lasers opens now the possibility to realize interferometric lithography systems at EUV wavelengths that easily fit on the top of an optical table. The high degree of spatial and temporal coherence and high brightness of the compact EUV laser sources make them a good option for interferometric applications. The combination of these novel sources with interferometric lithography setups brings to the laboratory environment capabilities that so far had been restricted exclusively to large synchrotron facilities. © 2009 Society of Photo-Optical Instrumentation Engineers.
author	Capeluto, María Gabriela Iemmi, Claudio César Marconi, Mario Carlos
author_facet	Capeluto, María Gabriela Iemmi, Claudio César Marconi, Mario Carlos
author_sort	Capeluto, María Gabriela
title	New opportunities in interferometric lithography using extreme ultraviolet tabletop lasers
title_short	New opportunities in interferometric lithography using extreme ultraviolet tabletop lasers
title_full	New opportunities in interferometric lithography using extreme ultraviolet tabletop lasers
title_fullStr	New opportunities in interferometric lithography using extreme ultraviolet tabletop lasers
title_full_unstemmed	New opportunities in interferometric lithography using extreme ultraviolet tabletop lasers
title_sort	new opportunities in interferometric lithography using extreme ultraviolet tabletop lasers
publishDate	2009
url	https://bibliotecadigital.exactas.uba.ar/collection/paper/document/paper_19325150_v8_n2_p_Wachulak http://hdl.handle.net/20.500.12110/paper_19325150_v8_n2_p_Wachulak
work_keys_str_mv	AT capelutomariagabriela newopportunitiesininterferometriclithographyusingextremeultraviolettabletoplasers AT iemmiclaudiocesar newopportunitiesininterferometriclithographyusingextremeultraviolettabletoplasers AT marconimariocarlos newopportunitiesininterferometriclithographyusingextremeultraviolettabletoplasers
_version_	1768546371413999616

New opportunities in interferometric lithography using extreme ultraviolet tabletop lasers

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