Design of a phase shifting interferometer in the EUV for high precision metrology

We present the design of phase shift interferometer for the extreme ultraviolet (EUV) that will be used with the illumination provided by a table top Ne-like Ar laser emitting at 46.9 nm. We develop a model that computes the beam propagation trough the instrument, taking into account the influence o...

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Detalles Bibliográficos
Autores principales: Capeluto, María Gabriela, Marconi, Mario Carlos, Iemmi, Claudio César
Publicado: 2011
Materias:
Argon lasers
Extreme ultraviolet lithography
Interferometers
Pulsed lasers
Ar-laser
EUV lasers
Extreme ultraviolets
High-precision
Ne-like
Phase-shift interferometer
Phase-shifting interferometers
Table-top
Phase shift
Acceso en línea:https://bibliotecadigital.exactas.uba.ar/collection/paper/document/paper_17426588_v274_n1_p_Capeluto
http://hdl.handle.net/20.500.12110/paper_17426588_v274_n1_p_Capeluto
Aporte de:
Biblioteca Digital - Facultad de Ciencias Exactas y Naturales (UBA) de Universidad de Buenos Aires
Descripción
Sumario:We present the design of phase shift interferometer for the extreme ultraviolet (EUV) that will be used with the illumination provided by a table top Ne-like Ar laser emitting at 46.9 nm. We develop a model that computes the beam propagation trough the instrument, taking into account the influence of the fluctuations from shot-to-shot of the pulsed EUV laser on the retrieved wavefront.

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