X-ray reflectivity analysis of titanium dioxide thin films grown by cathodic arc deposition

TiO 2 thin films deposited by a vacuum arc on a glass substrate were characterized by X-ray reflectivity (XRR), X-ray diffraction (XRD), scanning electron microscopy (SEM) and atomic force microscopy (AFM). Several thin films with different amounts of deposited TiO 2 mass and different deposition an...

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Detalles Bibliográficos
Publicado:	2014
Materias:	Cathodic Arc Deposition Thin Films X-Ray Reflectivity Atomic force microscopy Imaging techniques Oxide minerals Scanning electron microscopy Substrates Thin films Titanium dioxide Vacuum applications X ray diffraction Annealing temperatures Cathodic arc deposition Oscillatory behaviors Qualitative analysis TiO Titanium dioxide thin film X ray reflectivity X-ray reflectivity analysis Deposition
Acceso en línea:	https://bibliotecadigital.exactas.uba.ar/collection/paper/document/paper_15334880_v14_n5_p3902_Kleiman http://hdl.handle.net/20.500.12110/paper_15334880_v14_n5_p3902_Kleiman
Aporte de:	Biblioteca Digital - Facultad de Ciencias Exactas y Naturales (UBA) de Universidad de Buenos Aires

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