X-ray reflectivity analysis of titanium dioxide thin films grown by cathodic arc deposition
TiO 2 thin films deposited by a vacuum arc on a glass substrate were characterized by X-ray reflectivity (XRR), X-ray diffraction (XRD), scanning electron microscopy (SEM) and atomic force microscopy (AFM). Several thin films with different amounts of deposited TiO 2 mass and different deposition an...
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2014
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| Acceso en línea: | https://bibliotecadigital.exactas.uba.ar/collection/paper/document/paper_15334880_v14_n5_p3902_Kleiman http://hdl.handle.net/20.500.12110/paper_15334880_v14_n5_p3902_Kleiman |
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paper:paper_15334880_v14_n5_p3902_Kleiman2023-06-08T16:19:57Z X-ray reflectivity analysis of titanium dioxide thin films grown by cathodic arc deposition Cathodic Arc Deposition Thin Films X-Ray Reflectivity Atomic force microscopy Imaging techniques Oxide minerals Scanning electron microscopy Substrates Thin films Titanium dioxide Vacuum applications X ray diffraction Annealing temperatures Cathodic arc deposition Oscillatory behaviors Qualitative analysis TiO Titanium dioxide thin film X ray reflectivity X-ray reflectivity analysis Deposition TiO 2 thin films deposited by a vacuum arc on a glass substrate were characterized by X-ray reflectivity (XRR), X-ray diffraction (XRD), scanning electron microscopy (SEM) and atomic force microscopy (AFM). Several thin films with different amounts of deposited TiO 2 mass and different deposition and annealing temperatures were studied. A qualitative analysis of the XRD patterns indicated the presence of the anatase and/or rutile crystalline phases in most of the studied samples. From the analysis of the experimental XRR curves - which exhibited a wide angular range of oscillatory behavior - the thickness, mass density and interface roughness were determined. All XRR patterns were well fitted by modeled curves that assume the presence of a single and homogeneous TiO 2 layer over which a very thin H 2 O layer is adsorbed. The thickest H 2 O adsorption layers were developed in films with the highest anatase content. Our overall results of the XRR analyses are consistent with those derived from the imaging techniques (SEM and AFM). Copyright © 2014 American Scientific Publishers. 2014 https://bibliotecadigital.exactas.uba.ar/collection/paper/document/paper_15334880_v14_n5_p3902_Kleiman http://hdl.handle.net/20.500.12110/paper_15334880_v14_n5_p3902_Kleiman |
| institution |
Universidad de Buenos Aires |
| institution_str |
I-28 |
| repository_str |
R-134 |
| collection |
Biblioteca Digital - Facultad de Ciencias Exactas y Naturales (UBA) |
| topic |
Cathodic Arc Deposition Thin Films X-Ray Reflectivity Atomic force microscopy Imaging techniques Oxide minerals Scanning electron microscopy Substrates Thin films Titanium dioxide Vacuum applications X ray diffraction Annealing temperatures Cathodic arc deposition Oscillatory behaviors Qualitative analysis TiO Titanium dioxide thin film X ray reflectivity X-ray reflectivity analysis Deposition |
| spellingShingle |
Cathodic Arc Deposition Thin Films X-Ray Reflectivity Atomic force microscopy Imaging techniques Oxide minerals Scanning electron microscopy Substrates Thin films Titanium dioxide Vacuum applications X ray diffraction Annealing temperatures Cathodic arc deposition Oscillatory behaviors Qualitative analysis TiO Titanium dioxide thin film X ray reflectivity X-ray reflectivity analysis Deposition X-ray reflectivity analysis of titanium dioxide thin films grown by cathodic arc deposition |
| topic_facet |
Cathodic Arc Deposition Thin Films X-Ray Reflectivity Atomic force microscopy Imaging techniques Oxide minerals Scanning electron microscopy Substrates Thin films Titanium dioxide Vacuum applications X ray diffraction Annealing temperatures Cathodic arc deposition Oscillatory behaviors Qualitative analysis TiO Titanium dioxide thin film X ray reflectivity X-ray reflectivity analysis Deposition |
| description |
TiO 2 thin films deposited by a vacuum arc on a glass substrate were characterized by X-ray reflectivity (XRR), X-ray diffraction (XRD), scanning electron microscopy (SEM) and atomic force microscopy (AFM). Several thin films with different amounts of deposited TiO 2 mass and different deposition and annealing temperatures were studied. A qualitative analysis of the XRD patterns indicated the presence of the anatase and/or rutile crystalline phases in most of the studied samples. From the analysis of the experimental XRR curves - which exhibited a wide angular range of oscillatory behavior - the thickness, mass density and interface roughness were determined. All XRR patterns were well fitted by modeled curves that assume the presence of a single and homogeneous TiO 2 layer over which a very thin H 2 O layer is adsorbed. The thickest H 2 O adsorption layers were developed in films with the highest anatase content. Our overall results of the XRR analyses are consistent with those derived from the imaging techniques (SEM and AFM). Copyright © 2014 American Scientific Publishers. |
| title |
X-ray reflectivity analysis of titanium dioxide thin films grown by cathodic arc deposition |
| title_short |
X-ray reflectivity analysis of titanium dioxide thin films grown by cathodic arc deposition |
| title_full |
X-ray reflectivity analysis of titanium dioxide thin films grown by cathodic arc deposition |
| title_fullStr |
X-ray reflectivity analysis of titanium dioxide thin films grown by cathodic arc deposition |
| title_full_unstemmed |
X-ray reflectivity analysis of titanium dioxide thin films grown by cathodic arc deposition |
| title_sort |
x-ray reflectivity analysis of titanium dioxide thin films grown by cathodic arc deposition |
| publishDate |
2014 |
| url |
https://bibliotecadigital.exactas.uba.ar/collection/paper/document/paper_15334880_v14_n5_p3902_Kleiman http://hdl.handle.net/20.500.12110/paper_15334880_v14_n5_p3902_Kleiman |
| _version_ |
1768544100825432064 |