Nanopillars and arrays of nanoholes fabricated by extreme ultraviolet interferometric laser lithography

Arrays of holes and pillars were fabricated by multiple exposure interferometric lithography using a table top λ=46.9 nm wavelength laser. Size and the feature characteristic is controlled changing the applied exposure dose. ©2007 IEEE.

Detalles Bibliográficos
Publicado: 2007
Materias:
Annual meetings
Electro-optics
Interferometric lithography
Geodetic satellites
Interferometry
Lasers
Acceso en línea:https://bibliotecadigital.exactas.uba.ar/collection/paper/document/paper_10928081_v_n_p486_Wachulak
http://hdl.handle.net/20.500.12110/paper_10928081_v_n_p486_Wachulak
Aporte de:
Biblioteca Digital - Facultad de Ciencias Exactas y Naturales (UBA) de Universidad de Buenos Aires
id paper:paper_10928081_v_n_p486_Wachulak
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spelling paper:paper_10928081_v_n_p486_Wachulak2023-06-08T16:06:42Z Nanopillars and arrays of nanoholes fabricated by extreme ultraviolet interferometric laser lithography Annual meetings Electro-optics Interferometric lithography Geodetic satellites Interferometry Lasers Arrays of holes and pillars were fabricated by multiple exposure interferometric lithography using a table top λ=46.9 nm wavelength laser. Size and the feature characteristic is controlled changing the applied exposure dose. ©2007 IEEE. 2007 https://bibliotecadigital.exactas.uba.ar/collection/paper/document/paper_10928081_v_n_p486_Wachulak http://hdl.handle.net/20.500.12110/paper_10928081_v_n_p486_Wachulak
institution Universidad de Buenos Aires
institution_str I-28
repository_str R-134
collection Biblioteca Digital - Facultad de Ciencias Exactas y Naturales (UBA)
topic Annual meetings
Electro-optics
Interferometric lithography
Geodetic satellites
Interferometry
Lasers
spellingShingle Annual meetings
Electro-optics
Interferometric lithography
Geodetic satellites
Interferometry
Lasers
Nanopillars and arrays of nanoholes fabricated by extreme ultraviolet interferometric laser lithography
topic_facet Annual meetings
Electro-optics
Interferometric lithography
Geodetic satellites
Interferometry
Lasers
description Arrays of holes and pillars were fabricated by multiple exposure interferometric lithography using a table top λ=46.9 nm wavelength laser. Size and the feature characteristic is controlled changing the applied exposure dose. ©2007 IEEE.
title Nanopillars and arrays of nanoholes fabricated by extreme ultraviolet interferometric laser lithography
title_short Nanopillars and arrays of nanoholes fabricated by extreme ultraviolet interferometric laser lithography
title_full Nanopillars and arrays of nanoholes fabricated by extreme ultraviolet interferometric laser lithography
title_fullStr Nanopillars and arrays of nanoholes fabricated by extreme ultraviolet interferometric laser lithography
title_full_unstemmed Nanopillars and arrays of nanoholes fabricated by extreme ultraviolet interferometric laser lithography
title_sort nanopillars and arrays of nanoholes fabricated by extreme ultraviolet interferometric laser lithography
publishDate 2007
url https://bibliotecadigital.exactas.uba.ar/collection/paper/document/paper_10928081_v_n_p486_Wachulak
http://hdl.handle.net/20.500.12110/paper_10928081_v_n_p486_Wachulak
_version_ 1768545798906183680

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