Interferometric lithography with sub-100-nm resolution using a tabletop 46.9-nm laser
Combining a compact table top soft X ray laser with an interferometric lithography set up arrays of nanodots and nanoholes were directly patterned on the surface of different photoresists. Multiple exposures with a Lloyd's mirror interferometer printed arrays of holes and dots over an area of 0...
Guardado en:
| Publicado: |
2007
|
|---|---|
| Materias: | |
| Acceso en línea: | https://bibliotecadigital.exactas.uba.ar/collection/paper/document/paper_0277786X_v6702_n_p_Wachulak http://hdl.handle.net/20.500.12110/paper_0277786X_v6702_n_p_Wachulak |
| Aporte de: |
| Sumario: | Combining a compact table top soft X ray laser with an interferometric lithography set up arrays of nanodots and nanoholes were directly patterned on the surface of different photoresists. Multiple exposures with a Lloyd's mirror interferometer printed arrays of holes and dots over an area of 0.5× 0.5 mm2 with typical diameters down to 60 nm full width at half maximum. This laser-based soft X-ray interferometric tool demonstrated the possibility to print different nanoscale patterns using a compact table-top set up. |
|---|