Interferometric lithography with sub-100-nm resolution using a tabletop 46.9-nm laser
Combining a compact table top soft X ray laser with an interferometric lithography set up arrays of nanodots and nanoholes were directly patterned on the surface of different photoresists. Multiple exposures with a Lloyd's mirror interferometer printed arrays of holes and dots over an area of 0...
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2007
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Acceso en línea: | https://bibliotecadigital.exactas.uba.ar/collection/paper/document/paper_0277786X_v6702_n_p_Wachulak http://hdl.handle.net/20.500.12110/paper_0277786X_v6702_n_p_Wachulak |
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paper:paper_0277786X_v6702_n_p_Wachulak2023-06-08T15:26:30Z Interferometric lithography with sub-100-nm resolution using a tabletop 46.9-nm laser Interferometric lithography Nanopatterning Soft X-ray lasers Interferometry Mirrors Photoresists X ray lasers Interferometric lithography Nanodots Nanoholes Lithography Combining a compact table top soft X ray laser with an interferometric lithography set up arrays of nanodots and nanoholes were directly patterned on the surface of different photoresists. Multiple exposures with a Lloyd's mirror interferometer printed arrays of holes and dots over an area of 0.5× 0.5 mm2 with typical diameters down to 60 nm full width at half maximum. This laser-based soft X-ray interferometric tool demonstrated the possibility to print different nanoscale patterns using a compact table-top set up. 2007 https://bibliotecadigital.exactas.uba.ar/collection/paper/document/paper_0277786X_v6702_n_p_Wachulak http://hdl.handle.net/20.500.12110/paper_0277786X_v6702_n_p_Wachulak |
institution |
Universidad de Buenos Aires |
institution_str |
I-28 |
repository_str |
R-134 |
collection |
Biblioteca Digital - Facultad de Ciencias Exactas y Naturales (UBA) |
topic |
Interferometric lithography Nanopatterning Soft X-ray lasers Interferometry Mirrors Photoresists X ray lasers Interferometric lithography Nanodots Nanoholes Lithography |
spellingShingle |
Interferometric lithography Nanopatterning Soft X-ray lasers Interferometry Mirrors Photoresists X ray lasers Interferometric lithography Nanodots Nanoholes Lithography Interferometric lithography with sub-100-nm resolution using a tabletop 46.9-nm laser |
topic_facet |
Interferometric lithography Nanopatterning Soft X-ray lasers Interferometry Mirrors Photoresists X ray lasers Interferometric lithography Nanodots Nanoholes Lithography |
description |
Combining a compact table top soft X ray laser with an interferometric lithography set up arrays of nanodots and nanoholes were directly patterned on the surface of different photoresists. Multiple exposures with a Lloyd's mirror interferometer printed arrays of holes and dots over an area of 0.5× 0.5 mm2 with typical diameters down to 60 nm full width at half maximum. This laser-based soft X-ray interferometric tool demonstrated the possibility to print different nanoscale patterns using a compact table-top set up. |
title |
Interferometric lithography with sub-100-nm resolution using a tabletop 46.9-nm laser |
title_short |
Interferometric lithography with sub-100-nm resolution using a tabletop 46.9-nm laser |
title_full |
Interferometric lithography with sub-100-nm resolution using a tabletop 46.9-nm laser |
title_fullStr |
Interferometric lithography with sub-100-nm resolution using a tabletop 46.9-nm laser |
title_full_unstemmed |
Interferometric lithography with sub-100-nm resolution using a tabletop 46.9-nm laser |
title_sort |
interferometric lithography with sub-100-nm resolution using a tabletop 46.9-nm laser |
publishDate |
2007 |
url |
https://bibliotecadigital.exactas.uba.ar/collection/paper/document/paper_0277786X_v6702_n_p_Wachulak http://hdl.handle.net/20.500.12110/paper_0277786X_v6702_n_p_Wachulak |
_version_ |
1768546674424152064 |