Interferometric lithography with sub-100-nm resolution using a tabletop 46.9-nm laser

Combining a compact table top soft X ray laser with an interferometric lithography set up arrays of nanodots and nanoholes were directly patterned on the surface of different photoresists. Multiple exposures with a Lloyd's mirror interferometer printed arrays of holes and dots over an area of 0...

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Publicado: 2007
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Acceso en línea:https://bibliotecadigital.exactas.uba.ar/collection/paper/document/paper_0277786X_v6702_n_p_Wachulak
http://hdl.handle.net/20.500.12110/paper_0277786X_v6702_n_p_Wachulak
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id paper:paper_0277786X_v6702_n_p_Wachulak
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spelling paper:paper_0277786X_v6702_n_p_Wachulak2023-06-08T15:26:30Z Interferometric lithography with sub-100-nm resolution using a tabletop 46.9-nm laser Interferometric lithography Nanopatterning Soft X-ray lasers Interferometry Mirrors Photoresists X ray lasers Interferometric lithography Nanodots Nanoholes Lithography Combining a compact table top soft X ray laser with an interferometric lithography set up arrays of nanodots and nanoholes were directly patterned on the surface of different photoresists. Multiple exposures with a Lloyd's mirror interferometer printed arrays of holes and dots over an area of 0.5× 0.5 mm2 with typical diameters down to 60 nm full width at half maximum. This laser-based soft X-ray interferometric tool demonstrated the possibility to print different nanoscale patterns using a compact table-top set up. 2007 https://bibliotecadigital.exactas.uba.ar/collection/paper/document/paper_0277786X_v6702_n_p_Wachulak http://hdl.handle.net/20.500.12110/paper_0277786X_v6702_n_p_Wachulak
institution Universidad de Buenos Aires
institution_str I-28
repository_str R-134
collection Biblioteca Digital - Facultad de Ciencias Exactas y Naturales (UBA)
topic Interferometric lithography
Nanopatterning
Soft X-ray lasers
Interferometry
Mirrors
Photoresists
X ray lasers
Interferometric lithography
Nanodots
Nanoholes
Lithography
spellingShingle Interferometric lithography
Nanopatterning
Soft X-ray lasers
Interferometry
Mirrors
Photoresists
X ray lasers
Interferometric lithography
Nanodots
Nanoholes
Lithography
Interferometric lithography with sub-100-nm resolution using a tabletop 46.9-nm laser
topic_facet Interferometric lithography
Nanopatterning
Soft X-ray lasers
Interferometry
Mirrors
Photoresists
X ray lasers
Interferometric lithography
Nanodots
Nanoholes
Lithography
description Combining a compact table top soft X ray laser with an interferometric lithography set up arrays of nanodots and nanoholes were directly patterned on the surface of different photoresists. Multiple exposures with a Lloyd's mirror interferometer printed arrays of holes and dots over an area of 0.5× 0.5 mm2 with typical diameters down to 60 nm full width at half maximum. This laser-based soft X-ray interferometric tool demonstrated the possibility to print different nanoscale patterns using a compact table-top set up.
title Interferometric lithography with sub-100-nm resolution using a tabletop 46.9-nm laser
title_short Interferometric lithography with sub-100-nm resolution using a tabletop 46.9-nm laser
title_full Interferometric lithography with sub-100-nm resolution using a tabletop 46.9-nm laser
title_fullStr Interferometric lithography with sub-100-nm resolution using a tabletop 46.9-nm laser
title_full_unstemmed Interferometric lithography with sub-100-nm resolution using a tabletop 46.9-nm laser
title_sort interferometric lithography with sub-100-nm resolution using a tabletop 46.9-nm laser
publishDate 2007
url https://bibliotecadigital.exactas.uba.ar/collection/paper/document/paper_0277786X_v6702_n_p_Wachulak
http://hdl.handle.net/20.500.12110/paper_0277786X_v6702_n_p_Wachulak
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