Nanopatterning and nanomachining with table-top extreme ultraviolet lasers
Patterning of photo-resist was accomplished using a table top extreme ultraviolet (EUV) laser and an interferometric lithography set up. The high and controllable degree of coherence output of the recently developed EUV laser in Colorado State University was exploited in a Lloyd's mirror IL set...
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| Autores principales: | Marconi, Mario Carlos, Capeluto, María Gabriela |
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| Publicado: |
2006
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| Materias: | |
| Acceso en línea: | https://bibliotecadigital.exactas.uba.ar/collection/paper/document/paper_02729172_v961_n_p230_Marconi http://hdl.handle.net/20.500.12110/paper_02729172_v961_n_p230_Marconi |
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