Anatase TiO2 films obtained by cathodic arc deposition

TiO2 thin films were prepared on glass substrates at different temperatures employing an unfiltered cathodic arc device. The temperature values were varied from room temperature to 400 °C. The crystalline structure of the films was determined by X-ray diffraction. The surface morphology was studied...

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Autores principales: Kleiman, Ariel Javier, Marquez, Adriana B., Lamas, Diego Germán
Publicado: 2007
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Acceso en línea:https://bibliotecadigital.exactas.uba.ar/collection/paper/document/paper_02578972_v201_n14_p6358_Kleiman
http://hdl.handle.net/20.500.12110/paper_02578972_v201_n14_p6358_Kleiman
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spelling paper:paper_02578972_v201_n14_p6358_Kleiman2023-06-08T15:22:04Z Anatase TiO2 films obtained by cathodic arc deposition Kleiman, Ariel Javier Marquez, Adriana B. Lamas, Diego Germán Arc evaporation Atomic force microscopy (AFM) Structure Titanium oxide Deposition Grain size and shape Phase transitions Surface morphology Surface roughness Thermal effects Thin films Arc evaporation Cathodic arc deposition Crystalline structure Titanium dioxide Deposition Grain size and shape Phase transitions Surface morphology Surface roughness Thermal effects Thin films Titanium dioxide TiO2 thin films were prepared on glass substrates at different temperatures employing an unfiltered cathodic arc device. The temperature values were varied from room temperature to 400 °C. The crystalline structure of the films was determined by X-ray diffraction. The surface morphology was studied by scanning electron microscopy and atomic force microscopy. Transmittance in UV-visible region was also measured. All films deposited at temperatures lower than 300 °C were amorphous, whereas films obtained at higher temperatures grew in crystalline anatase phase. Phase transition amorphous-to-anatase was observed after post-annealing at 400 °C. The average transmittance value for all films was higher than 80%, a comparison among the films obtained at different temperatures showed a transmittance value slightly higher for films obtained at highest temperatures. Grain size for as-deposited crystalline films was determined approximately in 20 nm, with a surface roughness of about 2 nm. © 2006 Elsevier B.V. All rights reserved. Fil:Kleiman, A. Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales; Argentina. Fil:Márquez, A. Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales; Argentina. Fil:Lamas, D.G. Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales; Argentina. 2007 https://bibliotecadigital.exactas.uba.ar/collection/paper/document/paper_02578972_v201_n14_p6358_Kleiman http://hdl.handle.net/20.500.12110/paper_02578972_v201_n14_p6358_Kleiman
institution Universidad de Buenos Aires
institution_str I-28
repository_str R-134
collection Biblioteca Digital - Facultad de Ciencias Exactas y Naturales (UBA)
topic Arc evaporation
Atomic force microscopy (AFM)
Structure
Titanium oxide
Deposition
Grain size and shape
Phase transitions
Surface morphology
Surface roughness
Thermal effects
Thin films
Arc evaporation
Cathodic arc deposition
Crystalline structure
Titanium dioxide
Deposition
Grain size and shape
Phase transitions
Surface morphology
Surface roughness
Thermal effects
Thin films
Titanium dioxide
spellingShingle Arc evaporation
Atomic force microscopy (AFM)
Structure
Titanium oxide
Deposition
Grain size and shape
Phase transitions
Surface morphology
Surface roughness
Thermal effects
Thin films
Arc evaporation
Cathodic arc deposition
Crystalline structure
Titanium dioxide
Deposition
Grain size and shape
Phase transitions
Surface morphology
Surface roughness
Thermal effects
Thin films
Titanium dioxide
Kleiman, Ariel Javier
Marquez, Adriana B.
Lamas, Diego Germán
Anatase TiO2 films obtained by cathodic arc deposition
topic_facet Arc evaporation
Atomic force microscopy (AFM)
Structure
Titanium oxide
Deposition
Grain size and shape
Phase transitions
Surface morphology
Surface roughness
Thermal effects
Thin films
Arc evaporation
Cathodic arc deposition
Crystalline structure
Titanium dioxide
Deposition
Grain size and shape
Phase transitions
Surface morphology
Surface roughness
Thermal effects
Thin films
Titanium dioxide
description TiO2 thin films were prepared on glass substrates at different temperatures employing an unfiltered cathodic arc device. The temperature values were varied from room temperature to 400 °C. The crystalline structure of the films was determined by X-ray diffraction. The surface morphology was studied by scanning electron microscopy and atomic force microscopy. Transmittance in UV-visible region was also measured. All films deposited at temperatures lower than 300 °C were amorphous, whereas films obtained at higher temperatures grew in crystalline anatase phase. Phase transition amorphous-to-anatase was observed after post-annealing at 400 °C. The average transmittance value for all films was higher than 80%, a comparison among the films obtained at different temperatures showed a transmittance value slightly higher for films obtained at highest temperatures. Grain size for as-deposited crystalline films was determined approximately in 20 nm, with a surface roughness of about 2 nm. © 2006 Elsevier B.V. All rights reserved.
author Kleiman, Ariel Javier
Marquez, Adriana B.
Lamas, Diego Germán
author_facet Kleiman, Ariel Javier
Marquez, Adriana B.
Lamas, Diego Germán
author_sort Kleiman, Ariel Javier
title Anatase TiO2 films obtained by cathodic arc deposition
title_short Anatase TiO2 films obtained by cathodic arc deposition
title_full Anatase TiO2 films obtained by cathodic arc deposition
title_fullStr Anatase TiO2 films obtained by cathodic arc deposition
title_full_unstemmed Anatase TiO2 films obtained by cathodic arc deposition
title_sort anatase tio2 films obtained by cathodic arc deposition
publishDate 2007
url https://bibliotecadigital.exactas.uba.ar/collection/paper/document/paper_02578972_v201_n14_p6358_Kleiman
http://hdl.handle.net/20.500.12110/paper_02578972_v201_n14_p6358_Kleiman
work_keys_str_mv AT kleimanarieljavier anatasetio2filmsobtainedbycathodicarcdeposition
AT marquezadrianab anatasetio2filmsobtainedbycathodicarcdeposition
AT lamasdiegogerman anatasetio2filmsobtainedbycathodicarcdeposition
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