Block copolymer concentration gradient and solvent effects on nanostructuring of thin epoxy coatings modified with epoxidized styrene-butadiene-styrene block copolymers
The gradient on block copolymer concentration through film thickness as well as the effects of casting solvents used on the nanostructuring of a thermosetting epoxy coating modified with an epoxidized poly(styrene-b- butadiene-b-styrene) (SBS) triblock copolymer was studied by means of atomic force...
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2012
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| Acceso en línea: | https://bibliotecadigital.exactas.uba.ar/collection/paper/document/paper_00249297_v45_n3_p1483_Ramos http://hdl.handle.net/20.500.12110/paper_00249297_v45_n3_p1483_Ramos |
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paper:paper_00249297_v45_n3_p1483_Ramos2023-06-08T14:52:34Z Block copolymer concentration gradient and solvent effects on nanostructuring of thin epoxy coatings modified with epoxidized styrene-butadiene-styrene block copolymers Goyanes, Silvia Nair Attenuated total reflectance infrared spectroscopy Copolymer concentration Cross section Diglycidyl ether of bisphenol-A Epoxy coatings Epoxy-amine Fast curing Low temperatures N ,N-Dimethylformamide Nano-structuring Slow evaporation Small micelles Solvent effects Styrene butadiene styrenes Tetra-hydrofuran Thermosetting epoxy Thin coating films Variable thickness Atomic force microscopy Butadiene Coalescence Coatings Concrete beams and girders Dimethylformamide Epoxy resins Ethers Infrared spectroscopy Morphology Organic compounds Organic solvents Polybutadienes Solvents Styrene Thermosets Toluene Block copolymers The gradient on block copolymer concentration through film thickness as well as the effects of casting solvents used on the nanostructuring of a thermosetting epoxy coating modified with an epoxidized poly(styrene-b- butadiene-b-styrene) (SBS) triblock copolymer was studied by means of atomic force microscopy and attenuated total reflectance infrared spectroscopy. Thin coating films based on a commercial epoxy-amine formulation consisting of diglycidyl ether of bisphenol A and a low-temperature fast curing amine were modified with several amounts of epoxidized SBS triblock copolymer. Toluene and a mixture of tetrahydrofuran and N,N-dimethylformamide were used as casting solvents. With epoxidation degrees higher than 45 mol % of polybutadiene block nanostructuring was achieved. Fast curing rate of the epoxy/amine system and the comparatively slow evaporation rate of the casting solvent led to a gradient of morphologies through the film cross section owing to the coalescence of small micelles into larger micellar domains in the case of low block copolymer content. For these reasons, different morphologies were also obtained in the midtransverse section of a film with variable thickness. Finally, pseudolamellar nanostructure at high copolymer contents was achieved as confirmed by parallel and perpendicular cuttings to the air/polymer interface. © 2012 American Chemical Society. Fil:Goyanes, S. Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales; Argentina. 2012 https://bibliotecadigital.exactas.uba.ar/collection/paper/document/paper_00249297_v45_n3_p1483_Ramos http://hdl.handle.net/20.500.12110/paper_00249297_v45_n3_p1483_Ramos |
| institution |
Universidad de Buenos Aires |
| institution_str |
I-28 |
| repository_str |
R-134 |
| collection |
Biblioteca Digital - Facultad de Ciencias Exactas y Naturales (UBA) |
| topic |
Attenuated total reflectance infrared spectroscopy Copolymer concentration Cross section Diglycidyl ether of bisphenol-A Epoxy coatings Epoxy-amine Fast curing Low temperatures N ,N-Dimethylformamide Nano-structuring Slow evaporation Small micelles Solvent effects Styrene butadiene styrenes Tetra-hydrofuran Thermosetting epoxy Thin coating films Variable thickness Atomic force microscopy Butadiene Coalescence Coatings Concrete beams and girders Dimethylformamide Epoxy resins Ethers Infrared spectroscopy Morphology Organic compounds Organic solvents Polybutadienes Solvents Styrene Thermosets Toluene Block copolymers |
| spellingShingle |
Attenuated total reflectance infrared spectroscopy Copolymer concentration Cross section Diglycidyl ether of bisphenol-A Epoxy coatings Epoxy-amine Fast curing Low temperatures N ,N-Dimethylformamide Nano-structuring Slow evaporation Small micelles Solvent effects Styrene butadiene styrenes Tetra-hydrofuran Thermosetting epoxy Thin coating films Variable thickness Atomic force microscopy Butadiene Coalescence Coatings Concrete beams and girders Dimethylformamide Epoxy resins Ethers Infrared spectroscopy Morphology Organic compounds Organic solvents Polybutadienes Solvents Styrene Thermosets Toluene Block copolymers Goyanes, Silvia Nair Block copolymer concentration gradient and solvent effects on nanostructuring of thin epoxy coatings modified with epoxidized styrene-butadiene-styrene block copolymers |
| topic_facet |
Attenuated total reflectance infrared spectroscopy Copolymer concentration Cross section Diglycidyl ether of bisphenol-A Epoxy coatings Epoxy-amine Fast curing Low temperatures N ,N-Dimethylformamide Nano-structuring Slow evaporation Small micelles Solvent effects Styrene butadiene styrenes Tetra-hydrofuran Thermosetting epoxy Thin coating films Variable thickness Atomic force microscopy Butadiene Coalescence Coatings Concrete beams and girders Dimethylformamide Epoxy resins Ethers Infrared spectroscopy Morphology Organic compounds Organic solvents Polybutadienes Solvents Styrene Thermosets Toluene Block copolymers |
| description |
The gradient on block copolymer concentration through film thickness as well as the effects of casting solvents used on the nanostructuring of a thermosetting epoxy coating modified with an epoxidized poly(styrene-b- butadiene-b-styrene) (SBS) triblock copolymer was studied by means of atomic force microscopy and attenuated total reflectance infrared spectroscopy. Thin coating films based on a commercial epoxy-amine formulation consisting of diglycidyl ether of bisphenol A and a low-temperature fast curing amine were modified with several amounts of epoxidized SBS triblock copolymer. Toluene and a mixture of tetrahydrofuran and N,N-dimethylformamide were used as casting solvents. With epoxidation degrees higher than 45 mol % of polybutadiene block nanostructuring was achieved. Fast curing rate of the epoxy/amine system and the comparatively slow evaporation rate of the casting solvent led to a gradient of morphologies through the film cross section owing to the coalescence of small micelles into larger micellar domains in the case of low block copolymer content. For these reasons, different morphologies were also obtained in the midtransverse section of a film with variable thickness. Finally, pseudolamellar nanostructure at high copolymer contents was achieved as confirmed by parallel and perpendicular cuttings to the air/polymer interface. © 2012 American Chemical Society. |
| author |
Goyanes, Silvia Nair |
| author_facet |
Goyanes, Silvia Nair |
| author_sort |
Goyanes, Silvia Nair |
| title |
Block copolymer concentration gradient and solvent effects on nanostructuring of thin epoxy coatings modified with epoxidized styrene-butadiene-styrene block copolymers |
| title_short |
Block copolymer concentration gradient and solvent effects on nanostructuring of thin epoxy coatings modified with epoxidized styrene-butadiene-styrene block copolymers |
| title_full |
Block copolymer concentration gradient and solvent effects on nanostructuring of thin epoxy coatings modified with epoxidized styrene-butadiene-styrene block copolymers |
| title_fullStr |
Block copolymer concentration gradient and solvent effects on nanostructuring of thin epoxy coatings modified with epoxidized styrene-butadiene-styrene block copolymers |
| title_full_unstemmed |
Block copolymer concentration gradient and solvent effects on nanostructuring of thin epoxy coatings modified with epoxidized styrene-butadiene-styrene block copolymers |
| title_sort |
block copolymer concentration gradient and solvent effects on nanostructuring of thin epoxy coatings modified with epoxidized styrene-butadiene-styrene block copolymers |
| publishDate |
2012 |
| url |
https://bibliotecadigital.exactas.uba.ar/collection/paper/document/paper_00249297_v45_n3_p1483_Ramos http://hdl.handle.net/20.500.12110/paper_00249297_v45_n3_p1483_Ramos |
| work_keys_str_mv |
AT goyanessilvianair blockcopolymerconcentrationgradientandsolventeffectsonnanostructuringofthinepoxycoatingsmodifiedwithepoxidizedstyrenebutadienestyreneblockcopolymers |
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1768545316069441536 |