Fluorescent two-photon nanolithography
Improving the excitation conditions in two-photon fluorescent lithography reduces the size of the fabricated structures to nanometre scales. We demonstrate that a precise control of the illumination profile and the scanning speed of the laser beam is enough to decrease the photo-polymerization volum...
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| Autores principales: | , , |
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2008
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| Materias: | |
| Acceso en línea: | https://bibliotecadigital.exactas.uba.ar/collection/paper/document/paper_00222720_v229_n3_p540_Kunik http://hdl.handle.net/20.500.12110/paper_00222720_v229_n3_p540_Kunik |
| Aporte de: |
| Sumario: | Improving the excitation conditions in two-photon fluorescent lithography reduces the size of the fabricated structures to nanometre scales. We demonstrate that a precise control of the illumination profile and the scanning speed of the laser beam is enough to decrease the photo-polymerization volume of resins by orders of magnitude. This work also shows experimental evidence of surface effects that yield a different polymerization intensity threshold compared with bulk. Such phenomenon enables to perform a non-linear optical nanolithography in a simple way, allowing fast-prototyping procedures. We present a detailed study of the polymer growth process using fluorescence and atomic force microscopy. © 2008 The Authors. |
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