Different radical initiation techniques of hydrosilylation reactions of multiple bonds in water: thermal and photochemical initiation

The classical radical-based hydrosilylation reaction of organic compounds bearing C C multiple bonds is usually carried out in organic solvents and is herein presented in water with both hydrophobic and hydrophilic substrates. Thermal and photochemical initiations are used to accomplish the radical-...

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Autores principales: Calandra, Julia, Postigo, Al, Russo, Diana, Sbarbati Nudelman, Norma, Tereñas, Juan José
Formato: Artículo
Lenguaje:Inglés
Publicado: Universidad de Belgrano - Facultad de Ciencias Exactas y Naturales - Proyectos de Investigación 2014
Materias:
photochemical initiation
radical reactions in water
silyl radicals
iniciación fotoquímica
reacciones radicales en agua
radicales sililo
Acceso en línea:http://repositorio.ub.edu.ar/handle/123456789/2719
Aporte de:
Repositorio Institucional - Universidad de Belgrano (UB) de Universidad de Belgrano
id I36-R142-123456789-2719
record_format dspace
institution Universidad de Belgrano
institution_str I-36
repository_str R-142
collection Repositorio Institucional - Universidad de Belgrano (UB)
language Inglés
topic photochemical initiation
radical reactions in water
silyl radicals
iniciación fotoquímica
reacciones radicales en agua
radicales sililo
spellingShingle photochemical initiation
radical reactions in water
silyl radicals
iniciación fotoquímica
reacciones radicales en agua
radicales sililo
Calandra, Julia
Postigo, Al
Russo, Diana
Sbarbati Nudelman, Norma
Tereñas, Juan José
Different radical initiation techniques of hydrosilylation reactions of multiple bonds in water: thermal and photochemical initiation
topic_facet photochemical initiation
radical reactions in water
silyl radicals
iniciación fotoquímica
reacciones radicales en agua
radicales sililo
description The classical radical-based hydrosilylation reaction of organic compounds bearing C C multiple bonds is usually carried out in organic solvents and is herein presented in water with both hydrophobic and hydrophilic substrates. Thermal and photochemical initiations are used to accomplish the radical-induced hydrosilylation reaction of C C multiple bonds in water with tris(trimethylsilyl)silane ((Me3Si)3SiH). Photochemical radical initiation in the absence of a chemical radical precursor other than the silane is found to be a very efficient and convenient method to induce the hydrosilylation reaction of C C multiple bonds of organic compounds with (Me3Si)3SiH in water. This new alternate radical-based methodology studied in water is confronted with the classical radical thermal initiation of hydrosilylation reactions triggered through the thermal decomposition of azo compounds. Copyright © 2010 John Wiley & Sons, Ltd.
format Article
author Calandra, Julia
Postigo, Al
Russo, Diana
Sbarbati Nudelman, Norma
Tereñas, Juan José
author_facet Calandra, Julia
Postigo, Al
Russo, Diana
Sbarbati Nudelman, Norma
Tereñas, Juan José
author_sort Calandra, Julia
title Different radical initiation techniques of hydrosilylation reactions of multiple bonds in water: thermal and photochemical initiation
title_short Different radical initiation techniques of hydrosilylation reactions of multiple bonds in water: thermal and photochemical initiation
title_full Different radical initiation techniques of hydrosilylation reactions of multiple bonds in water: thermal and photochemical initiation
title_fullStr Different radical initiation techniques of hydrosilylation reactions of multiple bonds in water: thermal and photochemical initiation
title_full_unstemmed Different radical initiation techniques of hydrosilylation reactions of multiple bonds in water: thermal and photochemical initiation
title_sort different radical initiation techniques of hydrosilylation reactions of multiple bonds in water: thermal and photochemical initiation
publisher Universidad de Belgrano - Facultad de Ciencias Exactas y Naturales - Proyectos de Investigación
publishDate 2014
url http://repositorio.ub.edu.ar/handle/123456789/2719
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