Control of zinc plating solutions, determining the optimum concentration of thiourea additive by electrochemical techniques

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In this work we have analyzed the effect of thiourea concentration in the acid zinc deposition process. For these purpose, we have used the electrochemical techniques (cathodic voltammetry and Electrochemistry Impedance Spectroscopy, EIS). It allows determining the optimal concentration thiourea add...

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Autores principales: Mahmud, Z., Gordillo, G., Gassa, L., Ventura D'Alkaine, C.
Formato: Informe técnico submittedVersion
Lenguaje:Español
Publicado: Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales 2016
Materias:
zinc
electroplating
additives
EIS
Acceso en línea:http://hdl.handle.net/20.500.12110/technicalreport_n00014
http://repositoriouba.sisbi.uba.ar/gsdl/cgi-bin/library.cgi?a=d&c=aexreport&d=technicalreport_n00014_oai
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Repositorio Digital de la Universidad de Buenos Aires (UBA) de Universidad de Buenos Aires
id I28-R145-technicalreport_n00014_oai
record_format dspace
spelling I28-R145-technicalreport_n00014_oai2020-04-23 Mahmud, Z. Gordillo, G. Gassa, L. Ventura D'Alkaine, C. 2016-09 In this work we have analyzed the effect of thiourea concentration in the acid zinc deposition process. For these purpose, we have used the electrochemical techniques (cathodic voltammetry and Electrochemistry Impedance Spectroscopy, EIS). It allows determining the optimal concentration thiourea additive. In this range, we have obtained better finishes, more refined and decoratives layers. We have found in voltammetric studies that the electroreduction of Zn 2+ in the presence of thiourea is accelerated. The EIS studies has shown the “electrodeposition resistance” decrease in the presence of thiourea. The addition of more thiourea in the solution, in the optimum concentration, the electrodeposition resistance to the electrodeposition process is increased. The main contribution of this research and its scientific contribution is the use of electrochemical techniques for determining the optimal concentration of thiourea additive in the zinc electroplating solution in chloride acid media Fil: Mahmud, Z. Instituto Nacional de Tecnología Industrial. Procesos Superficiales; Argentina. Fil: Gordillo, G. Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales. Departamento de Química Inorgánica, Analítica y Química Física; Argentina. Fil: Gassa, L. Universidad Nacional de La Plata. Facultad de Ciencias Exactas. Instituto de Investigaciones Fisicoquímicas Teóricas y Aplicadas; Argentina. Fil: Ventura D'Alkaine, C. Universidade Federal de São Carlos; Brasil. application/pdf http://hdl.handle.net/20.500.12110/technicalreport_n00014 spa Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales info:eu-repo/semantics/openAccess http://creativecommons.org/licenses/by/2.5/ar zinc electroplating additives EIS Control of zinc plating solutions, determining the optimum concentration of thiourea additive by electrochemical techniques info:eu-repo/semantics/report info:ar-repo/semantics/informe técnico info:eu-repo/semantics/submittedVersion http://repositoriouba.sisbi.uba.ar/gsdl/cgi-bin/library.cgi?a=d&c=aexreport&d=technicalreport_n00014_oai
institution Universidad de Buenos Aires
institution_str I-28
repository_str R-145
collection Repositorio Digital de la Universidad de Buenos Aires (UBA)
language Español
orig_language_str_mv spa
topic zinc
electroplating
additives
EIS
spellingShingle zinc
electroplating
additives
EIS
Mahmud, Z.
Gordillo, G.
Gassa, L.
Ventura D'Alkaine, C.
Control of zinc plating solutions, determining the optimum concentration of thiourea additive by electrochemical techniques
topic_facet zinc
electroplating
additives
EIS
description In this work we have analyzed the effect of thiourea concentration in the acid zinc deposition process. For these purpose, we have used the electrochemical techniques (cathodic voltammetry and Electrochemistry Impedance Spectroscopy, EIS). It allows determining the optimal concentration thiourea additive. In this range, we have obtained better finishes, more refined and decoratives layers. We have found in voltammetric studies that the electroreduction of Zn 2+ in the presence of thiourea is accelerated. The EIS studies has shown the “electrodeposition resistance” decrease in the presence of thiourea. The addition of more thiourea in the solution, in the optimum concentration, the electrodeposition resistance to the electrodeposition process is increased. The main contribution of this research and its scientific contribution is the use of electrochemical techniques for determining the optimal concentration of thiourea additive in the zinc electroplating solution in chloride acid media
format Informe técnico
Informe técnico
submittedVersion
author Mahmud, Z.
Gordillo, G.
Gassa, L.
Ventura D'Alkaine, C.
author_facet Mahmud, Z.
Gordillo, G.
Gassa, L.
Ventura D'Alkaine, C.
author_sort Mahmud, Z.
title Control of zinc plating solutions, determining the optimum concentration of thiourea additive by electrochemical techniques
title_short Control of zinc plating solutions, determining the optimum concentration of thiourea additive by electrochemical techniques
title_full Control of zinc plating solutions, determining the optimum concentration of thiourea additive by electrochemical techniques
title_fullStr Control of zinc plating solutions, determining the optimum concentration of thiourea additive by electrochemical techniques
title_full_unstemmed Control of zinc plating solutions, determining the optimum concentration of thiourea additive by electrochemical techniques
title_sort control of zinc plating solutions, determining the optimum concentration of thiourea additive by electrochemical techniques
publisher Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales
publishDate 2016
url http://hdl.handle.net/20.500.12110/technicalreport_n00014
http://repositoriouba.sisbi.uba.ar/gsdl/cgi-bin/library.cgi?a=d&c=aexreport&d=technicalreport_n00014_oai
work_keys_str_mv AT mahmudz controlofzincplatingsolutionsdeterminingtheoptimumconcentrationofthioureaadditivebyelectrochemicaltechniques
AT gordillog controlofzincplatingsolutionsdeterminingtheoptimumconcentrationofthioureaadditivebyelectrochemicaltechniques
AT gassal controlofzincplatingsolutionsdeterminingtheoptimumconcentrationofthioureaadditivebyelectrochemicaltechniques
AT venturadalkainec controlofzincplatingsolutionsdeterminingtheoptimumconcentrationofthioureaadditivebyelectrochemicaltechniques
_version_ 1766017951247368192

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