Topography changes of rhodium electrodes induced by the application of fast periodic potential routines

The surface structure of polycrystalline rhodium electrodes in contact with aqueous sulfuric acid was modified by chemical etching with hot concentrated acid or by applying fast square waves with an upper potential equal to 1.55 V and a lower potential within the –0.75 V to –0.35 V range. Polycrysta...

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Autores principales: Méndez, Eduardo, Castro Luna Berenguer, Ana María del Carmen, Cerdá, María Fernanda, Mombrú, Alvaro W., Zinola Sánchez, Carlos Fernando, Martins, María Elisa
Formato: Articulo
Lenguaje:Inglés
Publicado: 2003
Materias:
Física
Química
Rhodium
Electrochemical faceting
Chemical etching
Acceso en línea:http://sedici.unlp.edu.ar/handle/10915/138539
Aporte de:
SEDICI (UNLP) de Universidad Nacional de La Plata
id I19-R120-10915-138539
record_format dspace
institution Universidad Nacional de La Plata
institution_str I-19
repository_str R-120
collection SEDICI (UNLP)
language Inglés
topic Física
Química
Rhodium
Electrochemical faceting
Chemical etching
spellingShingle Física
Química
Rhodium
Electrochemical faceting
Chemical etching
Méndez, Eduardo
Castro Luna Berenguer, Ana María del Carmen
Cerdá, María Fernanda
Mombrú, Alvaro W.
Zinola Sánchez, Carlos Fernando
Martins, María Elisa
Topography changes of rhodium electrodes induced by the application of fast periodic potential routines
topic_facet Física
Química
Rhodium
Electrochemical faceting
Chemical etching
description The surface structure of polycrystalline rhodium electrodes in contact with aqueous sulfuric acid was modified by chemical etching with hot concentrated acid or by applying fast square waves with an upper potential equal to 1.55 V and a lower potential within the –0.75 V to –0.35 V range. Polycrystalline rhodium and chemical etched electrodes were characterized by voltammetry, Cu underpotential deposition (upd) and X-ray diffraction. For electrofaceted surfaces were used voltammetry, Cu upd and SEM, revealing that two modified rhodium electrodes exhibit similar voltammetric characteristics as those found for Rh(111) and Rh(110) single crystals, and a third surface with an equal distribution of (110) and (111) planes. In addition, the upd of Cu on those surfaces corroborated the existence of those crystallographic planes. SEM micrographs show surface structures with a high density of terraces and steps. A mechanism of faceting is proposed.
format Articulo
Articulo
author Méndez, Eduardo
Castro Luna Berenguer, Ana María del Carmen
Cerdá, María Fernanda
Mombrú, Alvaro W.
Zinola Sánchez, Carlos Fernando
Martins, María Elisa
author_facet Méndez, Eduardo
Castro Luna Berenguer, Ana María del Carmen
Cerdá, María Fernanda
Mombrú, Alvaro W.
Zinola Sánchez, Carlos Fernando
Martins, María Elisa
author_sort Méndez, Eduardo
title Topography changes of rhodium electrodes induced by the application of fast periodic potential routines
title_short Topography changes of rhodium electrodes induced by the application of fast periodic potential routines
title_full Topography changes of rhodium electrodes induced by the application of fast periodic potential routines
title_fullStr Topography changes of rhodium electrodes induced by the application of fast periodic potential routines
title_full_unstemmed Topography changes of rhodium electrodes induced by the application of fast periodic potential routines
title_sort topography changes of rhodium electrodes induced by the application of fast periodic potential routines
publishDate 2003
url http://sedici.unlp.edu.ar/handle/10915/138539
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