Shock wave and modelling study of the unimolecular dissociation of Si(CH₃)₂F₂: an access to spectroscopic and kinetic properties of SiF₂

The thermal dissociation of Si(CH₃)₂F₂ was studied in shock waves between 1400 and 1900 K. UV absorption-time profiles of its dissociation products SiF₂ and CH₃ were monitored. The reaction proceeds as a unimolecular process not far from the high-pressure limit. Comparing modelled and experimental r...

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Autores principales: Cobos, Carlos Jorge, Sölter, Lars, Tellbach, Elsa, Troe, J.
Formato: Articulo
Lenguaje:Inglés
Publicado: 2021
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Acceso en línea:http://sedici.unlp.edu.ar/handle/10915/133175
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id I19-R120-10915-133175
record_format dspace
institution Universidad Nacional de La Plata
institution_str I-19
repository_str R-120
collection SEDICI (UNLP)
language Inglés
topic Física
unimolecular dissociation
spectroscopic and kinetic properties
spellingShingle Física
unimolecular dissociation
spectroscopic and kinetic properties
Cobos, Carlos Jorge
Sölter, Lars
Tellbach, Elsa
Troe, J.
Shock wave and modelling study of the unimolecular dissociation of Si(CH₃)₂F₂: an access to spectroscopic and kinetic properties of SiF₂
topic_facet Física
unimolecular dissociation
spectroscopic and kinetic properties
description The thermal dissociation of Si(CH₃)₂F₂ was studied in shock waves between 1400 and 1900 K. UV absorption-time profiles of its dissociation products SiF₂ and CH₃ were monitored. The reaction proceeds as a unimolecular process not far from the high-pressure limit. Comparing modelled and experimental results, an asymmetric representation of the falloff curves was shown to be most realistic. Modelled limiting high-pressure rate constants agreed well with the experimental data. The UV absorption spectrum of SiF₂ was shown to be quasi-continuous, with a maximum near 222 nm and a wavelength-integrated absorption cross section of 4.3 (±1) × 10⁻²³ cm³ (between 195 and 255 nm, base e), the latter being consistent with radiative lifetimes from the literature. Experiments over the range 1900-3200 K showed that SiF₂ was not consumed by a simple bond fission SiF₂ →SiF + F, but by a bimolecular reaction SiF₂ + SiF₂ → SiF + SiF₃ (rate constant in the range 10¹¹-10¹² cm³ mol⁻¹ s⁻¹), followed by the unimolecular dissociation SiF₃ → SiF₂ + F such that the reaction becomes catalyzed by the reactant SiF₂. The analogy to a pathway CF₂ + CF₂ → CF + CF₃, followed by CF₃ → CF₂ + F, in high-temperature fluorocarbon chemistry is stressed. Besides the high-temperature absorption cross sections of SiF₂, analogous data for SiF are also reported.
format Articulo
Articulo
author Cobos, Carlos Jorge
Sölter, Lars
Tellbach, Elsa
Troe, J.
author_facet Cobos, Carlos Jorge
Sölter, Lars
Tellbach, Elsa
Troe, J.
author_sort Cobos, Carlos Jorge
title Shock wave and modelling study of the unimolecular dissociation of Si(CH₃)₂F₂: an access to spectroscopic and kinetic properties of SiF₂
title_short Shock wave and modelling study of the unimolecular dissociation of Si(CH₃)₂F₂: an access to spectroscopic and kinetic properties of SiF₂
title_full Shock wave and modelling study of the unimolecular dissociation of Si(CH₃)₂F₂: an access to spectroscopic and kinetic properties of SiF₂
title_fullStr Shock wave and modelling study of the unimolecular dissociation of Si(CH₃)₂F₂: an access to spectroscopic and kinetic properties of SiF₂
title_full_unstemmed Shock wave and modelling study of the unimolecular dissociation of Si(CH₃)₂F₂: an access to spectroscopic and kinetic properties of SiF₂
title_sort shock wave and modelling study of the unimolecular dissociation of si(ch₃)₂f₂: an access to spectroscopic and kinetic properties of sif₂
publishDate 2021
url http://sedici.unlp.edu.ar/handle/10915/133175
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