Influence of seed layer thickness on properties of electrodeposited ZnO nanostructured films

The quality and properties of electrodeposited nanostructured ZnO films are improved when they are deposited on a crystal lattice-matching substrate. To this end, a highly conductive indium tin oxide substrate is covered with an interlayer of ZnO using direct-current magnetron sputtering. In this ma...

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Autores principales: Reyes Tolosa, M. D., Alajami, M., Montero Reguera, A. E., Damonte, Laura Cristina, Hernández Fenollosa, M. A.
Formato: Articulo
Lenguaje:Inglés
Publicado: 2019
Materias:
Ciencias Exactas
ZnO flms
Electrodeposition
DC magnetron sputtering
Optical properties
Nanostructures
Band gap energy
Acceso en línea:http://sedici.unlp.edu.ar/handle/10915/123737
Aporte de:
SEDICI (UNLP) de Universidad Nacional de La Plata
id I19-R120-10915-123737
record_format dspace
institution Universidad Nacional de La Plata
institution_str I-19
repository_str R-120
collection SEDICI (UNLP)
language Inglés
topic Ciencias Exactas
ZnO flms
Electrodeposition
DC magnetron sputtering
Optical properties
Nanostructures
Band gap energy
spellingShingle Ciencias Exactas
ZnO flms
Electrodeposition
DC magnetron sputtering
Optical properties
Nanostructures
Band gap energy
Reyes Tolosa, M. D.
Alajami, M.
Montero Reguera, A. E.
Damonte, Laura Cristina
Hernández Fenollosa, M. A.
Influence of seed layer thickness on properties of electrodeposited ZnO nanostructured films
topic_facet Ciencias Exactas
ZnO flms
Electrodeposition
DC magnetron sputtering
Optical properties
Nanostructures
Band gap energy
description The quality and properties of electrodeposited nanostructured ZnO films are improved when they are deposited on a crystal lattice-matching substrate. To this end, a highly conductive indium tin oxide substrate is covered with an interlayer of ZnO using direct-current magnetron sputtering. In this manuscript, we describe the effect of this interlayer on the morphological and optical properties of several nanostructured ZnO films grown by different electrodeposition methods. The thickness of the ZnO interlayer was varied starting from ultrathin layers of 10 nm all the way up to 230 nm as determined by ellipsometry. The structural and optical properties of the nanostructured ZnO films deposited on top of these interlayers were characterized using field emission scanning electron microscopy (FESEM), atomic force microscopy and UV–visible spectroscopy. Optimum properties of the nanostructured ZnO films for application in thin-film optoelectronic devices are obtained when the ZnO interlayer has a thickness of approximately 45 nm. This is the case for all the electrodeposition methods used in this work.
format Articulo
Articulo
author Reyes Tolosa, M. D.
Alajami, M.
Montero Reguera, A. E.
Damonte, Laura Cristina
Hernández Fenollosa, M. A.
author_facet Reyes Tolosa, M. D.
Alajami, M.
Montero Reguera, A. E.
Damonte, Laura Cristina
Hernández Fenollosa, M. A.
author_sort Reyes Tolosa, M. D.
title Influence of seed layer thickness on properties of electrodeposited ZnO nanostructured films
title_short Influence of seed layer thickness on properties of electrodeposited ZnO nanostructured films
title_full Influence of seed layer thickness on properties of electrodeposited ZnO nanostructured films
title_fullStr Influence of seed layer thickness on properties of electrodeposited ZnO nanostructured films
title_full_unstemmed Influence of seed layer thickness on properties of electrodeposited ZnO nanostructured films
title_sort influence of seed layer thickness on properties of electrodeposited zno nanostructured films
publishDate 2019
url http://sedici.unlp.edu.ar/handle/10915/123737
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