New opportunities in interferometric lithography using extreme ultraviolet tabletop lasers

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The development of tabletop extreme ultraviolet (EUV) lasers opens now the possibility to realize interferometric lithography systems at EUV wavelengths that easily fit on the top of an optical table. The high degree of spatial and temporal coherence and high brightness of the compact EUV laser sour...

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Autor principal: Wachulak, P.W
Otros Autores: Urbanski, L., Capeluto, María Gabriela, Hill, D., Rockward, W.S, Iemmi, C., Anderson, E.H, Menoni, C.S, Rocca, J.J, Marconi, M.C
Formato: Capítulo de libro
Lenguaje:Inglés
Publicado: SPIE 2009
Acceso en línea:Registro en Scopus
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LEADER 11550caa a22010457a 4500
001 PAPER-8246
003 AR-BaUEN
005 20241128101430.0
008 190411s2009 xx ||||fo|||| 00| 0 eng|d
024 7 |2 scopus  |a 2-s2.0-80055029727 
030 |a JMMMG 
040 |a Scopus  |b spa  |c AR-BaUEN  |d AR-BaUEN 
100 1 |a Wachulak, P.W. 
245 1 0 |a New opportunities in interferometric lithography using extreme ultraviolet tabletop lasers 
260 |b SPIE  |c 2009 
270 1 0 |m Wachulak, P.W.; Colorado State University, NSF ERC for Extreme Ultraviolet Science and Technology, Department of Electrical and Computer Engineering, Fort Collins, CO 80523, United States 
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506 |2 openaire  |e Política editorial 
520 3 |a The development of tabletop extreme ultraviolet (EUV) lasers opens now the possibility to realize interferometric lithography systems at EUV wavelengths that easily fit on the top of an optical table. The high degree of spatial and temporal coherence and high brightness of the compact EUV laser sources make them a good option for interferometric applications. The combination of these novel sources with interferometric lithography setups brings to the laboratory environment capabilities that so far had been restricted exclusively to large synchrotron facilities. © 2009 Society of Photo-Optical Instrumentation Engineers.  |l eng 
593 |a Colorado State University, NSF ERC for Extreme Ultraviolet Science and Technology, Department of Electrical and Computer Engineering, Fort Collins, CO 80523, United States 
593 |a Universidad de Buenos Aires, Departmento de Fisica, Facultad de Ciencias Exactas y Naturales, Buenos Aires, Argentina 
593 |a Morehouse College, Department of Physics, Atlanta, GA 30314, United States 
593 |a Lawrence Berkeley National Laboratory, Berkeley, CA, United States 
690 1 0 |a EXTREME ULTRAVIOLET (EUV) LASERS 
690 1 0 |a INTERFEROMETRIC LITHOGRAPHY 
690 1 0 |a NANOPATTERNING 
690 1 0 |a INTERFEROMETRY 
690 1 0 |a LITHOGRAPHY 
690 1 0 |a COMPACT EUV LASERS 
690 1 0 |a EXTREME ULTRAVIOLET 
690 1 0 |a EXTREME ULTRAVIOLET LASERS 
690 1 0 |a HIGH BRIGHTNESS 
690 1 0 |a INTERFEROMETRIC LITHOGRAPHY 
690 1 0 |a LABORATORY ENVIRONMENT 
690 1 0 |a NANOPATTERNING 
690 1 0 |a OPTICAL TABLES 
690 1 0 |a SPATIAL AND TEMPORAL COHERENCE 
690 1 0 |a TABLETOP LASERS 
690 1 0 |a ULTRAVIOLET LASERS 
700 1 |a Urbanski, L. 
700 1 |a Capeluto, María Gabriela 
700 1 |a Hill, D. 
700 1 |a Rockward, W.S. 
700 1 |a Iemmi, C. 
700 1 |a Anderson, E.H. 
700 1 |a Menoni, C.S. 
700 1 |a Rocca, J.J. 
700 1 |a Marconi, M.C. 
773 0 |d SPIE, 2009  |g v. 8  |k n. 2  |p J. Micro/ Nanolithogr. MEMS MOEMS  |x 19325150  |t Journal of Micro/Nanolithography, MEMS, and MOEMS 
856 4 1 |u https://www.scopus.com/inward/record.uri?eid=2-s2.0-80055029727&doi=10.1117%2f1.3129837&partnerID=40&md5=e9f4a5b0c7e903138782916374e0d4af  |x registro  |y Registro en Scopus 
856 4 0 |u https://doi.org/10.1117/1.3129837  |x doi  |y DOI 
856 4 0 |u https://hdl.handle.net/20.500.12110/paper_19325150_v8_n2_p_Wachulak  |x handle  |y Handle 
856 4 0 |u https://bibliotecadigital.exactas.uba.ar/collection/paper/document/paper_19325150_v8_n2_p_Wachulak  |x registro  |y Registro en la Biblioteca Digital 
961 |a paper_19325150_v8_n2_p_Wachulak  |b paper  |c PE 
962 |a info:eu-repo/semantics/article  |a info:ar-repo/semantics/artículo  |b info:eu-repo/semantics/publishedVersion 

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