Anatase TiO2 films obtained by cathodic arc deposition

TiO2 thin films were prepared on glass substrates at different temperatures employing an unfiltered cathodic arc device. The temperature values were varied from room temperature to 400 °C. The crystalline structure of the films was determined by X-ray diffraction. The surface morphology was studied...

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Autor principal: Kleiman, Ariel Javier
Otros Autores: Márquez, Adriana Beatriz, Lamas, Diego Germán
Formato: Capítulo de libro
Lenguaje:Inglés
Publicado: 2007
Acceso en línea:Registro en Scopus
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024 7 |2 scopus  |a 2-s2.0-33847163702 
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100 1 |a Kleiman, Ariel Javier 
245 1 0 |a Anatase TiO2 films obtained by cathodic arc deposition 
260 |c 2007 
270 1 0 |m Márquez, A.; Instituto de Física del Plasma (CONICET), Dpto. de Física, Fac. de Ciencias Exactas y Naturales, Cdad. Universitaria Pab. 1, C1428EHA Buenos Aires, Argentina; email: adriana@tinfip.lfp.uba.ar 
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504 |a Fujishima, A., Hashimoto, K., Watanabe, T., (1999) TiO2 Photocatalysis: Fundamentals and Applications, , BKC, Tokyo 
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506 |2 openaire  |e Política editorial 
520 3 |a TiO2 thin films were prepared on glass substrates at different temperatures employing an unfiltered cathodic arc device. The temperature values were varied from room temperature to 400 °C. The crystalline structure of the films was determined by X-ray diffraction. The surface morphology was studied by scanning electron microscopy and atomic force microscopy. Transmittance in UV-visible region was also measured. All films deposited at temperatures lower than 300 °C were amorphous, whereas films obtained at higher temperatures grew in crystalline anatase phase. Phase transition amorphous-to-anatase was observed after post-annealing at 400 °C. The average transmittance value for all films was higher than 80%, a comparison among the films obtained at different temperatures showed a transmittance value slightly higher for films obtained at highest temperatures. Grain size for as-deposited crystalline films was determined approximately in 20 nm, with a surface roughness of about 2 nm. © 2006 Elsevier B.V. All rights reserved.  |l eng 
536 |a Detalles de la financiación: Universidad de Buenos Aires 
536 |a Detalles de la financiación: Consejo Nacional de Investigaciones Científicas y Técnicas 
536 |a Detalles de la financiación: The authors would like to thank Martín Mirenda and Enrique San Román for their collaboration in the optical measurements. This work was supported by grants from Buenos Aires University and CONICET. 
593 |a Instituto de Física del Plasma (CONICET), Dpto. de Física, Fac. de Ciencias Exactas y Naturales, Cdad. Universitaria Pab. 1, C1428EHA Buenos Aires, Argentina 
593 |a Centro de Investigaciones en Sólidos, CITEFA- CONICET, J.B. de La Salle 4397, B1603ALO Villa Martelli Provincia BA, Argentina 
690 1 0 |a ARC EVAPORATION 
690 1 0 |a ATOMIC FORCE MICROSCOPY (AFM) 
690 1 0 |a STRUCTURE 
690 1 0 |a TITANIUM OXIDE 
690 1 0 |a DEPOSITION 
690 1 0 |a GRAIN SIZE AND SHAPE 
690 1 0 |a PHASE TRANSITIONS 
690 1 0 |a SURFACE MORPHOLOGY 
690 1 0 |a SURFACE ROUGHNESS 
690 1 0 |a THERMAL EFFECTS 
690 1 0 |a THIN FILMS 
690 1 0 |a ARC EVAPORATION 
690 1 0 |a CATHODIC ARC DEPOSITION 
690 1 0 |a CRYSTALLINE STRUCTURE 
690 1 0 |a TITANIUM DIOXIDE 
690 1 0 |a DEPOSITION 
690 1 0 |a GRAIN SIZE AND SHAPE 
690 1 0 |a PHASE TRANSITIONS 
690 1 0 |a SURFACE MORPHOLOGY 
690 1 0 |a SURFACE ROUGHNESS 
690 1 0 |a THERMAL EFFECTS 
690 1 0 |a THIN FILMS 
690 1 0 |a TITANIUM DIOXIDE 
700 1 |a Márquez, Adriana Beatriz 
700 1 |a Lamas, Diego Germán 
773 0 |d 2007  |g v. 201  |h pp. 6358-6362  |k n. 14  |p Surf. Coat. Technol.  |x 02578972  |w (AR-BaUEN)CENRE-6945  |t Surface and Coatings Technology 
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856 4 0 |u https://doi.org/10.1016/j.surfcoat.2006.12.002  |y DOI 
856 4 0 |u https://hdl.handle.net/20.500.12110/paper_02578972_v201_n14_p6358_Kleiman  |y Handle 
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