Interferometric lithography at 46.9 nm
We present the first results of nano-patterning in poly-methyl methacrylate (PMMA) photo-resist using a 46.9 nm tabletop extreme ultraviolet (EUV) laser. As a proof of principle, we recorded a Fresnel diffraction pattern of a copper mesh with 19 μm square holes. Results of ongoing interference exper...
| Autor principal: | |
|---|---|
| Otros Autores: | , , , , , , , , |
| Formato: | Acta de conferencia Capítulo de libro |
| Lenguaje: | Inglés |
| Publicado: |
2004
|
| Acceso en línea: | Registro en Scopus DOI Handle Registro en la Biblioteca Digital |
| Aporte de: | Registro referencial: Solicitar el recurso aquí |
| LEADER | 04332caa a22006737a 4500 | ||
|---|---|---|---|
| 001 | PAPER-21101 | ||
| 003 | AR-BaUEN | ||
| 005 | 20241128101917.0 | ||
| 008 | 190411s2004 xx ||||fo|||| 10| 0 eng|d | ||
| 024 | 7 | |2 scopus |a 2-s2.0-17644413753 | |
| 030 | |a PSISD | ||
| 040 | |a Scopus |b spa |c AR-BaUEN |d AR-BaUEN | ||
| 100 | 1 | |a Capeluto, María Gabriela | |
| 245 | 1 | 0 | |a Interferometric lithography at 46.9 nm |
| 260 | |c 2004 | ||
| 270 | 1 | 0 | |m Departamento de Fisica, Universidad de Buenos AiresArgentina; email: maga@df.uba.ar |
| 504 | |a Bjorkholm, J.E., EUV lithography - The successor to optical lithography Intel Technology Journal QE'98 | ||
| 504 | |a Solak, H.H., He, D., Li, W., Cerrina, F., Nanolithography using extreme ultraviolet lithography interferometry: 19 ran lines and spaces (1999) J. Vac. Sci. Technol. B, 17 (6), p. 3052 | ||
| 504 | |a Solak, H.H., He, D., Li, W., Singh-Gasson, S., Cerrina, F., Sohn, B.H., Yang, X.M., Nealey, P., Exposure of 38 nm period grating patterns with extreme ultraviolet interferometric lithography (1999) Appl. Phys. Lett., 75, p. 2328 | ||
| 504 | |a Macchietto, Benware, B.R., Rocca, J.J., Generation of millijoule-level soft-x-ray laser pulses at a 4-Hz repetition rate in a highly saturated tabletop capillary discharge amplifier (1999) Optics Letters, 24 (16), p. 1115 | ||
| 504 | |a Liu, Y., Seminario, M., Tomasel, F.G., Chang, C., Rocca, J., Attwood, D.T., Achievement of essentially full spatial coherence in a high-average-power soft-x-ray laser (2001) Physical Review A., 63, p. 033802A4 - Instituto Venezolano de Investigaciones Cientificas; Universidad Simon Bolivar; Universidad Central de Venezuela; Ministerio de ciencia y Tecnologia; Fundacion Polar | ||
| 506 | |2 openaire |e Política editorial | ||
| 520 | 3 | |a We present the first results of nano-patterning in poly-methyl methacrylate (PMMA) photo-resist using a 46.9 nm tabletop extreme ultraviolet (EUV) laser. As a proof of principle, we recorded a Fresnel diffraction pattern of a copper mesh with 19 μm square holes. Results of ongoing interference experiments will also be presented. |l eng | |
| 593 | |a Departamento de Fisica, Universidad de Buenos Aires, Argentina | ||
| 593 | |a Dept. of Elec. and Comp. Engineering, Colorado State University, United States | ||
| 593 | |a NSF Eng. Res. Ctr. Extreme U.S./T., Argentina | ||
| 593 | |a Centro de Microscopias Avanzadas, Universidad de Buenos Aires, Argentina | ||
| 690 | 1 | 0 | |a EUV LITHOGRAPHY |
| 690 | 1 | 0 | |a INTERFEROMETRIC LITHOGRAPHY |
| 690 | 1 | 0 | |a NANOPATTERNING |
| 690 | 1 | 0 | |a ELECTROMAGNETIC WAVE DIFFRACTION |
| 690 | 1 | 0 | |a ELECTRONS |
| 690 | 1 | 0 | |a INTERFEROMETRY |
| 690 | 1 | 0 | |a LASER APPLICATIONS |
| 690 | 1 | 0 | |a POLYMETHYL METHACRYLATES |
| 690 | 1 | 0 | |a ULTRAVIOLET RADIATION |
| 690 | 1 | 0 | |a EUV LITHOGRAPHY |
| 690 | 1 | 0 | |a INTERFEROMETRIC LITHOGRAPHY |
| 690 | 1 | 0 | |a LASER SOURCE |
| 690 | 1 | 0 | |a NANOPATTERNING |
| 690 | 1 | 0 | |a LITHOGRAPHY |
| 700 | 1 | |a Vaschenko, G. | |
| 700 | 1 | |a Grisham, M.E. | |
| 700 | 1 | |a Marconi, M.C. | |
| 700 | 1 | |a Menoni, C.S. | |
| 700 | 1 | |a Rocca, J.J. | |
| 700 | 1 | |a Ludueña, S. | |
| 700 | 1 | |a Pietrasanta, L. | |
| 700 | 1 | |a Marcano O. A. | |
| 700 | 1 | |a Paz J.L. | |
| 711 | 2 | |c Porlamar |d 3 October 2004 through 8 October 2004 |g Código de la conferencia: 64642 | |
| 773 | 0 | |d 2004 |g v. 5622 |h pp. 735-738 |k n. PART 2 |p Proc SPIE Int Soc Opt Eng |n Proceedings of SPIE - The International Society for Optical Engineering |x 0277786X |t RIAO/OPTILAS 2004: 5th Iberoamerican Meeting on Optics, and 8th Latin American Meeting on Optics, Lasers, and their Applications; ICO Regional Meeting | |
| 856 | 4 | 1 | |u https://www.scopus.com/inward/record.uri?eid=2-s2.0-17644413753&doi=10.1117%2f12.592201&partnerID=40&md5=a640b05e8ca6565293099016cb3e64d6 |x registro |y Registro en Scopus |
| 856 | 4 | 0 | |u https://doi.org/10.1117/12.592201 |x doi |y DOI |
| 856 | 4 | 0 | |u https://hdl.handle.net/20.500.12110/paper_0277786X_v5622_nPART2_p735_Capeluto |x handle |y Handle |
| 856 | 4 | 0 | |u https://bibliotecadigital.exactas.uba.ar/collection/paper/document/paper_0277786X_v5622_nPART2_p735_Capeluto |x registro |y Registro en la Biblioteca Digital |
| 961 | |a paper_0277786X_v5622_nPART2_p735_Capeluto |b paper |c NP | ||
| 962 | |a info:eu-repo/semantics/conferenceObject |a info:ar-repo/semantics/documento de conferencia |b info:eu-repo/semantics/publishedVersion | ||
| 963 | |a NORI | ||