Cita APA (7a ed.)

Wachulak, P., Urbanski, L., Capeluto, M., Hill, D., Rockward, W., Iemmi, C., . . . Marconi, M. New opportunities in interferometric lithography using extreme ultraviolet tabletop lasers.

Cita Chicago Style (17a ed.)

Wachulak, P.W, et al. New Opportunities in Interferometric Lithography Using Extreme Ultraviolet Tabletop Lasers.

Cita MLA (8a ed.)

Wachulak, P.W, et al. New Opportunities in Interferometric Lithography Using Extreme Ultraviolet Tabletop Lasers.