Nanopatterning with interferometric lithography using a compact λ = 46.9-nm laser
We report the imprinting of nanometer-scale gratings by interferometric lithography at λ = 46.9 nm using an Ne-like Ar capillary discharge laser. Gratings with periods as small as 55 nm were imprinted on poly-methyl methacrylate using a Lloyd's mirror interferometer. This first demonstration of...
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| Autores principales: | Capeluto, M.G., Vaschenko, G., Grisham, M., Marconi, M.C., Ludueña, S., Pietrasanta, L., Lu, Y., Parkinson, B., Menoni, C.S., Rocca, J.J. |
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| Formato: | JOUR |
| Materias: | |
| Acceso en línea: | http://hdl.handle.net/20.500.12110/paper_1536125X_v5_n1_p3_Capeluto |
| Aporte de: |
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