Kinetics and mechanism of thermal gas-phase oxidation of hexafluoropropene in the presence of trifluoromethylhypofluorite, CF3OF

The oxidation of hexafluoropropene with molecular oxygen in the presence of CF3OF has been studied at 303.0, 313.0 and 323.4 K, using a conventional static system. The initial pressure of CF3OF was varied between 1.7 and 16.6 Torr, that of C3F6 between 10.0 and 120.2 Torr and that of O2 between 82.0...

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Detalles Bibliográficos
Autores principales:	Dos Santos Afonso, M., Romano, R.M., Della Védova, C.O., Czarnowski, J.
Formato:	JOUR
Materias:	organofluorine derivative propylene article chemical binding chemical reaction decomposition kinetics oxidation reaction analysis thermal analysis
Acceso en línea:	http://hdl.handle.net/20.500.12110/paper_14639076_v2_n7_p1393_DosSantosAfonso
Aporte de:	Biblioteca Digital - Facultad de Ciencias Exactas y Naturales (UBA) de Universidad de Buenos Aires

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