Table top nanopatterning with extreme ultraviolet laser illumination
Patterning with extreme ultraviolet light generated by a compact, bright laser source operating at a wavelength of 46.9 nm is demonstrated using two complementary approaches: multiple beam interferometric lithography and de-magnifying projection. Features with sizes ranging from 370 nm to 60 nm were...
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| Autores principales: | Capeluto, M.G., Wachulak, P., Marconi, M.C., Patel, D., Menoni, C.S., Rocca, J.J., Iemmi, C., Anderson, E.H., Chao, W., Attwood, D.T. |
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| Formato: | JOUR |
| Materias: | |
| Acceso en línea: | http://hdl.handle.net/20.500.12110/paper_01679317_v84_n5-8_p721_Capeluto |
| Aporte de: |
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