Nanopatterning in a compact setup using table top extreme ultraviolet lasers

The recent development of table top extreme ultraviolet (EUV) lasers have enabled new applications that so far were restricted to the use of large facilities. These compact sources bring now to the laboratory environment the capabilities that will allow a broader application of techniques related to...

Descripción completa

Guardado en:

Detalles Bibliográficos
Autores principales:	Capeluto, María Gabriela, Marconi, Mario Carlos
Publicado:	2008
Materias:	EUV lasers Interferometric lithography Nanopatterning Photoresist Electron beam lithography Extreme ultraviolet lithography Interferometry Nanotechnology Photoresists Polymethyl methacrylates Capillary discharge lasers Extreme ultraviolet lasers Full width half maximum Hydrogen silsesquioxane Laboratory environment NanoPatterning Ultraviolet lasers
Acceso en línea:	https://bibliotecadigital.exactas.uba.ar/collection/paper/document/paper_12303402_v16_n4_p444_Wachulak http://hdl.handle.net/20.500.12110/paper_12303402_v16_n4_p444_Wachulak
Aporte de:	Biblioteca Digital - Facultad de Ciencias Exactas y Naturales (UBA) de Universidad de Buenos Aires

Ejemplares similares

Nanopatterning in a compact setup using table top extreme ultraviolet lasers
por: Wachulak, P.W., et al.
Publicado: (2008)

Nanopatterning in a compact setup using table top extreme ultraviolet lasers
por: Wachulak, P.W., et al.

Nanopatterning in a compact setup using table top extreme ultraviolet lasers
por: Wachulak, P.W., et al.
Publicado: (2008)

Table top nanopatterning with extreme ultraviolet laser illumination
por: Capeluto, María Gabriela, et al.
Publicado: (2007)

Table top nanopatterning with extreme ultraviolet laser illumination
por: Capeluto, M.G., et al.

New opportunities in interferometric lithography using extreme ultraviolet tabletop lasers
por: Capeluto, María Gabriela, et al.
Publicado: (2009)

New opportunities in interferometric lithography using extreme ultraviolet tabletop lasers
por: Wachulak, P.W., et al.

Interferometric lithography at 46.9 nm
por: Capeluto, M.G., et al.

Interferometric lithography at 46.9 nm
Publicado: (2004)

Nanoscale patterning in high resolution HSQ photoresist by interferometric lithography with tabletop extreme ultraviolet lasers
por: Wachulak, P.W., et al.

Nanoscale patterning in high resolution HSQ photoresist by interferometric lithography with tabletop extreme ultraviolet lasers
Publicado: (2007)

Interferometric lithography with sub-100-nm resolution using a tabletop 46.9-nm laser
por: Wachulak, P.W., et al.

Interferometric lithography with sub-100-nm resolution using a tabletop 46.9-nm laser
Publicado: (2007)

Nanopatterning and nanomachining with table-top extreme ultraviolet lasers
por: Marconi, Mario Carlos, et al.
Publicado: (2006)

Nanopatterning and nanomachining with table-top extreme ultraviolet lasers
por: Marconi, M.C., et al.

Arrays of sub-100 nm features fabricated with table top extreme ultraviolet interferometric laser lithography
por: Wachulak, P.W., et al.

Arrays of sub-100 nm features fabricated with table top extreme ultraviolet interferometric laser lithography
por: Wachulak, P.W., et al.

Arrays of sub-100 nm features fabricated with table top extreme ultraviolet interferometric laser lithography
Publicado: (2007)

Nanopatterning with interferometric lithography using a compact λ = 46.9-nm laser
por: Capeluto, M.G., et al.

Arrays of sub-100 nm features fabricated with table top extreme ultraviolet interferometric laser lithography
Publicado: (2007)

Nanopatterning with interferometric lithography using a compact λ = 46.9-nm laser
Publicado: (2006)

Nanolitografía y metrología de alta precisión en el ultravioleta extremo
por: Capeluto, María Gabriela
Publicado: (2009)

Nanolitografía y metrología de alta precisión en el ultravioleta extremo
por: Capeluto, María Gabriela
Publicado: (2009)

Nanolitografía y metrología de alta precisión en el ultravioleta extremo
por: Capeluto, María Gabriela
Publicado: (2009)

Design of a phase shifting interferometer in the EUV for high precision metrology
por: Capeluto, M.G., et al.
Publicado: (2011)

Design of a phase shifting interferometer in the EUV for high precision metrology
por: Capeluto, M.G., et al.

Design of a phase shifting interferometer in the EUV for high precision metrology
por: Capeluto, M.G., et al.
Publicado: (2011)

Design of a phase shifting interferometer in the EUV for high precision metrology
por: Capeluto, María Gabriela, et al.
Publicado: (2011)

Nanopillars and arrays of nanoholes fabricated by extreme ultraviolet interferometric laser lithography
por: Wachulak, P.W., et al.

Nanopillars and arrays of nanoholes fabricated by extreme ultraviolet interferometric laser lithography
Publicado: (2007)

Design of a phase-shifting interferometer in the extreme ultraviolet for high-precision metrology
por: Capeluto, María Gabriela, et al.
Publicado: (2014)

Design of a phase-shifting interferometer in the extreme ultraviolet for high-precision metrology
por: Capeluto, M.G., et al.

Efficient picosecond x-ray pulse generation from plasmas in the radiation dominated regime
por: Hollinger, R., et al.

Efficient picosecond x-ray pulse generation from plasmas in the radiation dominated regime
Publicado: (2017)

Design of a compact device to generate and test beams with orbital angular momentum in the EUV
por: Pabon, D.O., et al.

Refraction effects on x-ray and ultraviolet interferometric probing of laser-produced plasmas
Publicado: (2003)

Refraction effects on x-ray and ultraviolet interferometric probing of laser-produced plasmas
por: Smith, R.F., et al.

Design of a compact device to generate and test beams with orbital angular momentum in the EUV
Publicado: (2017)

Dense plasma diagnostics with an amplitude-division soft-x-ray laser interferometer based on diffraction gratings
por: Marconi, Mario Carlos, et al.
Publicado: (2000)

Dense plasma diagnostics with an amplitude-division soft-x-ray laser interferometer based on diffraction gratings
por: Filevich, J., et al.