Formation of an extended CoSi₂ thin nanohexagons array coherently buried in silicon single crystal
A Co-doped silica film was deposited on the surface of a Si(100) wafer and isothermally annealed at 750 °C to form spherical Co nanoparticles embedded in the silica film and a few atomic layer thick CoSi₂ nanoplatelets within the wafer. The structure, morphology, and spatial orientation of the nanop...
Guardado en:
| Autores principales: | , , , , , , , |
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| Formato: | Articulo |
| Lenguaje: | Inglés |
| Publicado: |
2012
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| Materias: | |
| Acceso en línea: | http://sedici.unlp.edu.ar/handle/10915/99645 |
| Aporte de: |
| Sumario: | A Co-doped silica film was deposited on the surface of a Si(100) wafer and isothermally annealed at 750 °C to form spherical Co nanoparticles embedded in the silica film and a few atomic layer thick CoSi₂ nanoplatelets within the wafer. The structure, morphology, and spatial orientation of the nanoplatelets were characterized. The experimental results indicate that the nanoplatelets exhibit hexagonal shape and a uniform thickness. The CoSi₂ nanostructures lattice is coherent with the Si lattice, and each of them is parallel to one of the four planes belonging to the {111} crystallographic form of the host lattice. |
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