Ellipsometry and electron diffraction study of anodically formed Pd oxide layer

Anodic Pd oxide films grown in l M H<sub>2</sub>SO<sub>4</sub> and l M HClO<sub>4</sub> during the time τ(15s ⩽ τ ⩽ 9000 s) at the potential E<sub>τ</sub>(1.90 V ⩽ E<sub>τ</sub> ⩽ 2.06 V) have been investigated by ellipsometry and electron...

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Detalles Bibliográficos
Autores principales:	Bolzán, Agustín Eduardo, Zerbino, Jorge Omar, Macchi, E., Arvia, Alejandro Jorge
Formato:	Articulo
Lenguaje:	Inglés
Publicado:	1993
Materias:	Ciencias Exactas Química Pd oxide layers Electrochemistry
Acceso en línea:	http://sedici.unlp.edu.ar/handle/10915/120775
Aporte de:	SEDICI (UNLP) de Universidad Nacional de La Plata

Descripción
Sumario:	Anodic Pd oxide films grown in l M H<sub>2</sub>SO<sub>4</sub> and l M HClO<sub>4</sub> during the time τ(15s ⩽ τ ⩽ 9000 s) at the potential E<sub>τ</sub>(1.90 V ⩽ E<sub>τ</sub> ⩽ 2.06 V) have been investigated by ellipsometry and electron diffraction techniques. Ellipsometry confirms the duplex structure of the anodic Pd oxide films earlier concluded from electrochemical data. Electron diffraction reveals epitaxial growth of PdO on Pd at early stages. The film thickness fits a logarithmic growth rate equation for oxide layer thicknesses greater than 10–20nm, depending on the solution composition.